SCHEMBL5828197

SCHEMBL5828197

COS(C)(C)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 3/20 0.39
HTR6 P50406 2/20 0.39
PSIP1 O75475 1/20 0.39
ALDH1A1 P00352 3/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
CA14 Q9ULX7 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
TSHR P16473 2/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA3 P07451 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36
PLA2G7 Q13093 1/20 0.36
CA13 Q8N1Q1 1/20 0.36
CA5B Q9Y2D0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5607138 0.76 HTR6 (0.47) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL22263422 0.74 CA4 (0.41) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL2090405 0.74 CA4 (0.41) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL4446975 0.70 HTR6 (0.44) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL3299477 0.70 PTGS2 (0.36) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL94530 0.70 HTR6 (0.50) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL21647647 0.70 TSHR (0.46) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL2937203 0.69 HTR6 (0.47) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL3253436 0.69 HTR6 (0.47) CA4HTR6PSIP1ALDH1A1CA12
SCHEMBL20419428 0.69 HTR6 (0.47) CA4HTR6PSIP1ALDH1A1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100565338-C What comprise the Photoactive compounds potpourri is used for the lithographic photoetching compositions of deep ultraviolet AZ ELECTRONIC MATERIALS JAPAN (JP) 2009-12-02 CN disclosed
US-6991888-B2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-01-31 US disclosed
CN-1659477-A Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds AZ ELECTRONIC MATERIALS USA (JP) 2005-08-24 CN disclosed
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP disclosed
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds MERCK PATENT GMBH (DE) 2003-12-25 US disclosed
US-20030235775-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds CLARIANT INTERNATIONAL LTD (CH) 2003-12-25 US disclosed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds SUN2, UROD, ERCC1 CA4 125/4885HTR6 4314/4885PSIP1 2361/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.