SCHEMBL5830403

SCHEMBL5830403

C=C(CCCOCCCCC)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.46
THRB P10828 2/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
HTT P42858 1/20 0.44
MAPT P10636 1/20 0.44
TSHR P16473 6/20 0.43
PLA2G4B P0C869 1/20 0.40
AKR1B1 P15121 1/20 0.40
FNTA P49354 1/20 0.40
FNTB P49356 1/20 0.40
PGGT1B P53609 1/20 0.40
EPHX2 P34913 1/20 0.39
GPR84 Q9NQS5 6/20 0.39
PPARG P37231 6/20 0.39
PPARD Q03181 6/20 0.39
PPARA Q07869 6/20 0.39
HDAC11 Q96DB2 5/20 0.39
ALDH1A1 P00352 2/20 0.39
TLR2 O60603 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1895747 0.98 CES2 (0.48) CES2THRBMEN1KMT2AHTT
SCHEMBL5399493 0.98 CES2 (0.48) CES2THRBMEN1KMT2AHTT
SCHEMBL3382149 0.98 CES2 (0.48) CES2THRBMEN1KMT2AHTT
SCHEMBL5386601 0.98 CES2 (0.48) CES2THRBMEN1KMT2AHTT
SCHEMBL5382939 0.98 CES2 (0.48) CES2THRBMEN1KMT2AHTT
SCHEMBL125262 0.94 TSHR (0.45) CES2THRBMEN1KMT2AHTT
SCHEMBL6273168 0.92 TSHR (0.43) CES2THRBMEN1KMT2AHTT
SCHEMBL9238627 0.92 CES2 (0.46) CES2THRBMEN1KMT2AHTT
SCHEMBL985177 0.92 TSHR (0.43) CES2THRBMEN1KMT2AHTT
SCHEMBL9935605 0.91 CES2 (0.48) CES2THRBMEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101650-B2 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2006-09-05 US claimed
US-20040248030-A1 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2004-12-09 US claimed
WO-2003017001-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST DONGJIN SEMICHEM CO., LTD. (KR) 2003-02-27 WO claimed
CN-100557509-C Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2009-11-04 CN disclosed
CN-100445846-C Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2008-12-24 CN disclosed
US-7101650-B2 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2006-09-05 US disclosed
CN-1261822-C Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2006-06-28 CN disclosed
CN-1766732-A Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2006-05-03 CN disclosed
CN-1766719-A Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2006-05-03 CN disclosed
US-20040248030-A1 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2004-12-09 US disclosed
CN-1543591-A Photosensitive resin composition for photoresist 东进瑟弥侃株式会社 2004-11-03 CN disclosed
WO-2003017001-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST DONGJIN SEMICHEM CO., LTD. (KR) 2003-02-27 WO disclosed