SCHEMBL985177

SCHEMBL985177

C=C(CCCOCCOCCCC)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.43
CYP3A4 P08684 1/20 0.42
RARB P10826 2/20 0.41
THRB P10828 2/20 0.39
MEN1 O00255 1/20 0.39
HTT P42858 1/20 0.39
KMT2A Q03164 1/20 0.39
MAPT P10636 1/20 0.39
ALDH1A1 P00352 1/20 0.38
CES2 O00748 1/20 0.37
HPGD P15428 1/20 0.37
PLA2G4B P0C869 1/20 0.37
FNTA P49354 1/20 0.36
FNTB P49356 1/20 0.36
PGGT1B P53609 1/20 0.36
AKR1B1 P15121 1/20 0.35
RARA P10276 1/20 0.35
ATM Q13315 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL125262 0.98 TSHR (0.45) TSHRCYP3A4RARBTHRBMEN1
SCHEMBL7531172 0.95 THRB (0.41) TSHRCYP3A4RARBTHRBMEN1
SCHEMBL5830403 0.92 CES2 (0.46) TSHRTHRBMEN1HTTKMT2A
SCHEMBL5292928 0.92 TSHR (0.43) TSHRCYP3A4RARBTHRBMEN1
SCHEMBL6273168 0.92 TSHR (0.43) TSHRTHRBMEN1HTTKMT2A
SCHEMBL871679 0.91 CES2 (0.44) TSHRTHRBMEN1HTTKMT2A
SCHEMBL5399493 0.91 CES2 (0.48) TSHRTHRBMEN1HTTKMT2A
SCHEMBL1895747 0.91 CES2 (0.48) TSHRTHRBMEN1HTTKMT2A
SCHEMBL5386601 0.91 CES2 (0.48) TSHRTHRBMEN1HTTKMT2A
SCHEMBL5382939 0.91 CES2 (0.48) TSHRTHRBMEN1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2935288-B1 SILYL ESTER COPOLYMER JOTUN AS (NO) 2016-10-19 EP claimed
US-20240189861-A1 MULTILAYER BARRIER FILM, ITS MANUFACTURE AND USE IN PHOTOVOLTAIC APPLICATIONS BASF COATINGS GMBH (DE) 2024-06-13 US disclosed
US-20230077371-A1 CURABLE COMPOSITION, CURABLE INK, COMPOSITION CONTAINER, DEVICE FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE, METHOD OF FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE, CURED MATTER, AND DECORATIVE OBJECT RICOH COMPANY, LTD. (JP) 2023-03-16 US disclosed
US-10559777-B2 Radiation curable composition for water scavenging layer, and method of manufacturing the same BASF COATINGS GMBH (DE) 2020-02-11 US disclosed
EP-3398975-A1 PHOTOSENSITIVE COMPOSITION San-Apro Limited (JP) 2018-11-07 EP disclosed
EP-3378875-A1 PHOTOPOLYMERIZATION INITIATOR, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, INKJET RECORDING METHOD AND ACYLPHOSPHINE OXIDE COMPOUND Fujifilm Corporation (JP) 2018-09-26 EP disclosed
EP-2535379-B1 Ink set and image forming method FUJIFILM CORP (JP) 2018-05-16 EP disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9791734-B2 Module for liquid crystal display apparatus and liquid crystal display apparatus comprising the same SAMSUNG SDI CO., LTD. (KR) 2017-10-17 US disclosed
EP-2902212-B1 IMAGE FORMATION METHOD FUJIFILM CORP (JP) 2017-09-06 EP disclosed
EP-1167445-A2 Foamable poly(meth)acrylate plastisol, and process for preparing it Röhm GmbH & Co. KG (DE) 2002-01-02 EP disclosed
EP-0947558-A1 Poly(meth)acrylic resins with high molecular weight for use in plastisols Degussa-Hüls Aktiengesellschaft (DE) 1999-10-06 EP disclosed
EP-0774483-A2 Plastisols based on plasticizer treated polymers RÖHM GMBH (DE) 1997-05-21 EP disclosed
EP-0477708-B1 Thermically film forming matter based on polymethacrylate and plasticized by addition of plasticizer ROEHM GMBH (DE) 1997-04-23 EP disclosed
EP-0471258-B1 Process for preparing homooligomers and cooligomers ROEHM GMBH (DE) 1996-10-16 EP disclosed
EP-0612788-A1 Improved plastisols Röhm GmbH (DE) 1994-08-31 EP disclosed
US-5120637-A Storage stability FUJI PHOTO FILM CO., LTD. (JP) 1992-06-09 US disclosed
EP-0477708-A2 Thermically film forming matter based on polymethacrylate and plasticized by addition of plasticizer RÖHM GMBH (DE) 1992-04-01 EP disclosed
EP-0471258-A2 Process for preparing homooligomers and cooligomers Röhm GmbH (DE) 1992-02-19 EP disclosed
EP-0332165-A2 Silver halide color reversal photographic light-sensitive material Fuji Photo Film Co., Ltd. (JP) 1989-09-13 EP disclosed