Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.32 |
| ▸ | UGT2B7 | P16662 | 1/20 | 0.30 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.30 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30385379 | 0.86 | PPM1B (0.37) | POLBTDP1APEX1 | |
| SCHEMBL14074016 | 0.82 | POLB (0.38) | POLBTDP1APEX1CTDSP1 | |
| SCHEMBL1005287 | 0.82 | POLB (0.38) | POLBTDP1APEX1CTDSP1 | |
| SCHEMBL2832119 | 0.82 | POLB (0.38) | POLBTDP1APEX1CTDSP1 | |
| SCHEMBL20349477 | 0.82 | POLB (0.38) | POLBTDP1APEX1CTDSP1 | |
| SCHEMBL12342891 | 0.72 | APLNR (0.35) | POLBTDP1APEX1 | |
| SCHEMBL11950520 | 0.72 | APLNR (0.30) | POLBTDP1APEX1 | |
| SCHEMBL1791944 | 0.70 | POLB (0.33) | POLBTDP1APEX1CTDSP1 | |
| SCHEMBL11108301 | 0.69 | PPM1B (0.36) | POLB | |
| SCHEMBL6175009 | 0.69 | PPM1B (0.36) | POLBTDP1APEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6987155-B2 | Polymers for photoresist and photoresist compositions using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2006-01-17 | — | — | US | disclosed |
| US-20030191259-A1 | Novel polymers for photoresist and photoresist compositions using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2003-10-09 | — | — | US | disclosed |
| US-6569971-B2 | Monomers bicyclo(2.2.2)oct-5-ene-2,3-dicarboxylic anhydride or 5-norbornene-2,3-dicarboxylic anhydride; photoresists for photolithography using deep ultraviolet light sources | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2003-05-27 | — | — | US | disclosed |
| US-20020049287-A1 | NOVEL POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS USING THE SAME | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-04-25 | — | — | US | disclosed |