SCHEMBL5833638

SCHEMBL5833638

C[Si](C)(C)c1ccc2c(C(=O)O)ccc(C(=O)O)c2c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACE2 Q9BYF1 2/20 0.44
HPGD P15428 2/20 0.39
ACHE P22303 1/20 0.39
CYP1A2 P05177 1/20 0.38
PTPN1 P18031 1/20 0.37
KDM4A O75164 2/20 0.36
TSHR P16473 3/20 0.35
ALDH1A1 P00352 2/20 0.35
CA12 O43570 2/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA7 P43166 2/20 0.35
CA9 Q16790 2/20 0.35
CA14 Q9ULX7 2/20 0.35
CYP2C9 P11712 2/20 0.35
HSD17B10 Q99714 2/20 0.35
ALOX12 P18054 1/20 0.35
ATIC P31939 1/20 0.35
GABRP O00591 1/20 0.35
GABRD O14764 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9730784 0.78 RXRB (0.47) HPGDACHECYP1A2ALDH1A1HSD17B10
SCHEMBL28515999 0.78 ALDH1A1 (0.55) HPGDPTPN1TSHRALDH1A1CA12
SCHEMBL5833643 0.74 CSNK2A1 (0.55) ACE2HPGDCYP1A2ALDH1A1CA12
SCHEMBL7495328 0.73 CYP1A2 (0.58) ACE2HPGDCYP1A2PTPN1TSHR
SCHEMBL12188075 0.73 KDM4E (0.57) HPGDACHEKDM4AALDH1A1CYP2C9
SCHEMBL8932122 0.73 KDM4E (0.43) HPGDACHEKDM4ELMNA
SCHEMBL5434295 0.71 CYP1A2 (0.55) ACE2CYP1A2PTPN1TSHRALDH1A1
SCHEMBL31401787 0.71 CYP1A2 (0.55) ACE2CYP1A2PTPN1TSHRALDH1A1
SCHEMBL31401768 0.71 ACE2 (0.68) ACE2HPGDCYP1A2PTPN1TSHR
SCHEMBL29904697 0.71 ACE2 (0.68) ACE2HPGDCYP1A2PTPN1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed