SCHEMBL5833733

SCHEMBL5833733

O=C(O)c1cc(C2C3CC4CC(C3)CC2C4)c(C(=O)O)c2ccccc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.38
HPGD P15428 2/20 0.37
HSD17B10 Q99714 2/20 0.37
CYP2C9 P11712 1/20 0.37
TSHR P16473 1/20 0.37
ALOX12 P18054 1/20 0.37
ATIC P31939 1/20 0.37
KDM4E B2RXH2 3/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
ALDH1A1 P00352 1/20 0.37
CYP1A2 P05177 1/20 0.37
GLA P06280 1/20 0.37
CYP2C19 P33261 1/20 0.37
EPHX2 P34913 1/20 0.36
RXFP1 Q9HBX9 1/20 0.35
SCN9A Q15858 2/20 0.35
WDR5 P61964 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17323569 0.78 KMT2A (0.45) HPGDHSD17B10CYP2C9KDM4EMEN1
SCHEMBL28775613 0.77 NR4A1 (0.33) SCN9A
SCHEMBL28223258 0.77 ALDH1A1 (0.45) POLBHPGDCYP2C9KDM4EKMT2A
Hydrochloric Acid SCHEMBL2710119 0.75 CYP2C9 (0.44) POLBHPGDCYP2C9KDM4EKMT2A
SCHEMBL19249590 0.75 SCN9A (0.40) KMT2AEPHX2SCN9A
SCHEMBL20143094 0.73 SCN9A (0.36) HSD17B10SCN9A
Benzoic Acid SCHEMBL29142624 0.72 TSHR (0.44) CYP2C9TSHRKDM4EKMT2AALDH1A1
SCHEMBL31401764 0.70 HPGD (0.57) HPGDHSD17B10CYP2C9TSHRALOX12
SCHEMBL29417867 0.70 HPGD (0.57) HPGDHSD17B10CYP2C9TSHRALOX12
SCHEMBL29511 0.70 HPGD (0.57) HPGDHSD17B10CYP2C9TSHRALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed