Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 3/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.33 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17323556 | 0.83 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL19249590 | 0.80 | SCN9A (0.40) | SCN9AHSD11B1SCN5A | |
| SCHEMBL25634613 | 0.76 | SLC6A3 (0.33) | SCN9ASCN5A | |
| SCHEMBL2758399 | 0.74 | SCN9A (0.38) | SCN9ASCN5A | |
| SCHEMBL5833733 | 0.73 | POLB (0.38) | SCN9AHSD17B10 | |
| SCHEMBL27199191 | 0.73 | CNR1 (0.37) | SCN9A | |
| SCHEMBL17323569 | 0.71 | KMT2A (0.45) | SCN9ASCN5AHSD17B10 | |
| SCHEMBL22321085 | 0.69 | MEN1 (0.41) | SCN9A | |
| SCHEMBL23040780 | 0.69 | CYP2C9 (0.36) | HSD11B1 | |
| SCHEMBL5834427 | 0.68 | SCN9A (0.42) | SCN9AHSD11B1SCN5AHSD17B10L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-9969829-B2 | Polymer compound, negative resist composition, laminate, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |