Ethylene

Ethylene

SCHEMBL5833978

C=C.CC(C)(C)O[SiH](OC(C)(C)C)C(C)(C)C

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703026 0.93 TSHR (0.31)
Ethane SCHEMBL5834783 0.90
Ethylene SCHEMBL5834104 0.69
SCHEMBL5833497 0.67
SCHEMBL2804394 0.65 TSHR (0.31)
SCHEMBL5833586 0.63 TSHR (0.32)
Ethylene SCHEMBL5833658 0.63
SCHEMBL5833314 0.63 TSHR (0.32)
Ethylene SCHEMBL5834043 0.63
SCHEMBL273377 0.62 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7005532-B2 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2006-02-28 US disclosed
US-20050020845-A1 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2005-01-27 US disclosed
EP-1428828-A1 PROCESS FOR PREPARATION OF ALKOXYSILANES TOAGOSEI CO., LTD. (JP) 2004-06-16 EP disclosed