SCHEMBL5834636

SCHEMBL5834636

C[Si](C)(C)c1ccc(C(=O)O)cc1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.47
HPGD P15428 1/20 0.45
MYC P01106 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
TSHR P16473 3/20 0.42
TP53 P04637 1/20 0.42
CA12 O43570 2/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA4 P22748 2/20 0.42
CA6 P23280 2/20 0.42
CA7 P43166 2/20 0.42
CA9 Q16790 2/20 0.42
CA14 Q9ULX7 2/20 0.42
GAA P10253 2/20 0.42
POLB P06746 1/20 0.42
MAPT P10636 1/20 0.42
PTGS2 P35354 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
PTPN1 P18031 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5834234 0.84 MYC (0.47) KDM4EHPGDMYCTDP1TSHR
SCHEMBL9675379 0.83 HPGD (0.48) KDM4EHPGDTDP1TSHRTP53
SCHEMBL7745596 0.78 GABRP (0.42) KDM4ETDP1TSHRCA12CA1
SCHEMBL19471884 0.76 TSHR (0.49) KDM4EHPGDMYCTDP1TSHR
SCHEMBL27673092 0.74 RARA (0.48) KDM4EHPGDMYCTDP1TSHR
Methyl Alcohol SCHEMBL29156163 0.74 KDM4E (0.64) KDM4EMYCTDP1TSHRTP53
SCHEMBL9742325 0.74 GABRP (0.39) KDM4ETDP1TSHRMAPTALDH1A1
SCHEMBL23279 0.73 KDM4E (0.69) KDM4EMYCTDP1TSHRTP53
SCHEMBL29899307 0.73 KDM4E (0.69) KDM4EMYCTDP1TSHRTP53
SCHEMBL23861 0.73 KDM4E (0.69) KDM4EMYCTDP1TSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed