SCHEMBL5842841

SCHEMBL5842841

CCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2ccc(OCCCC)c(OCCCC)c2)cc1OCCCC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR3 Q99500 1/20 0.43
TSHR P16473 3/20 0.41
CA12 O43570 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
CA9 Q16790 2/20 0.41
CA7 P43166 1/20 0.41
WDR5 P61964 3/20 0.40
LMNA P02545 3/20 0.39
HTT P42858 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KEAP1 Q14145 1/20 0.37
NFE2L2 Q16236 1/20 0.37
MAPK1 P28482 3/20 0.36
MAPT P10636 2/20 0.36
HSD17B10 Q99714 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
MMP1 P03956 2/20 0.36
ADAMTS4 O75173 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5845456 0.96 S1PR3 (0.48) S1PR3TSHRCA12CA1CA2
SCHEMBL5845643 0.95 S1PR3 (0.50) S1PR3LMNAHTTMAPK1MAPT
SCHEMBL5843745 0.95 S1PR3 (0.50) S1PR3LMNAHTTMAPK1MAPT
SCHEMBL5845015 0.95 S1PR3 (0.50) S1PR3LMNAHTTMAPK1MAPT
SCHEMBL5844803 0.95 S1PR3 (0.50) S1PR3LMNAHTTMAPK1MAPT
SCHEMBL5844030 0.95 S1PR3 (0.50) S1PR3LMNAHTTMAPK1MAPT
SCHEMBL5843870 0.90 S1PR3 (0.46) S1PR3WDR5LMNAMAPTMEN1
SCHEMBL6738870 0.89 WDR5 (0.52) S1PR3TSHRCA12CA1CA2
SCHEMBL5844396 0.88 CA12 (0.41) S1PR3TSHRCA12CA1CA2
SCHEMBL5844949 0.86 PPARG (0.38) S1PR3TSHRCA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 S1PR3 1891/4885TSHR 2355/4885CA12 3234/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.