SCHEMBL5844949

SCHEMBL5844949

CCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C2CCCCC2)cc1OCCCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 3/20 0.38
TSHR P16473 3/20 0.36
MAPK1 P28482 1/20 0.36
RECQL P46063 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
S1PR3 Q99500 1/20 0.36
PTGES O14684 1/20 0.36
ALOX5 P09917 1/20 0.36
ALDH1A1 P00352 2/20 0.34
LMNA P02545 2/20 0.34
HPGD P15428 1/20 0.34
HSD17B10 Q99714 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
WDR5 P61964 2/20 0.34
CNR2 P34972 3/20 0.33
FAAH O00519 2/20 0.33
GAA P10253 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5844724 0.91 TSHR (0.37) PPARGTSHRMAPK1RECQLL3MBTL1
SCHEMBL5881892 0.86 TSHR (0.40) TSHRMAPK1RECQLL3MBTL1PTGES
SCHEMBL5842841 0.86 S1PR3 (0.43) TSHRMAPK1RECQLL3MBTL1S1PR3
SCHEMBL5845432 0.84 ALOX5 (0.41) PPARGTSHRMAPK1RECQLL3MBTL1
SCHEMBL6739607 0.83 TSHR (0.44) TSHRMAPK1RECQLL3MBTL1ALDH1A1
SCHEMBL6736211 0.83 TSHR (0.44) TSHRMAPK1RECQLL3MBTL1ALDH1A1
SCHEMBL5881654 0.83 THRA (0.39) TSHRMAPK1RECQLL3MBTL1CNR2
SCHEMBL5862518 0.83 MEN1 (0.45) PPARGTSHRPTGESALOX5ALDH1A1
SCHEMBL5843889 0.83 HTT (0.38) PPARGTSHRMAPK1L3MBTL1PTGES
SCHEMBL5845456 0.82 S1PR3 (0.48) TSHRMAPK1S1PR3ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 PPARG 437/4885TSHR 2355/4885MAPK1 329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.