SCHEMBL5843398

SCHEMBL5843398

CCCCCOc1cc(C)c(S(=O)(=O)C(=[N+]=[N-])C(=O)c2ccccc2)cc1OCCCCC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
WDR5 P61964 2/20 0.40
S1PR5 Q9H228 2/20 0.39
PTPN11 Q06124 2/20 0.39
S1PR3 Q99500 4/20 0.38
CES2 O00748 2/20 0.38
CES1 P23141 2/20 0.38
MEN1 O00255 1/20 0.37
NR1I2 O75469 1/20 0.37
LMNA P02545 1/20 0.37
CHRM2 P08172 1/20 0.37
CYP3A4 P08684 1/20 0.37
ADRA2A P08913 1/20 0.37
MAPT P10636 1/20 0.37
OPRK1 P41145 1/20 0.37
HTR2B P41595 1/20 0.37
SLC6A3 Q01959 1/20 0.37
KMT2A Q03164 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5843961 0.88 CNR1 (0.37) S1PR5
SCHEMBL5862927 0.86 PTPN11 (0.40) WDR5PTPN11S1PR3MEN1LMNA
SCHEMBL5862527 0.85 PTPN11 (0.42) WDR5PTPN11S1PR3CES2CES1
SCHEMBL5845465 0.84 PLA2G4B (0.43) WDR5PTPN11S1PR3KMT2A
SCHEMBL5844161 0.84 PLA2G4B (0.43) PTPN11S1PR3KMT2A
SCHEMBL5843788 0.84 S1PR3 (0.46) WDR5PTPN11S1PR3CES2CES1
SCHEMBL5862526 0.83 WDR5 (0.40) WDR5PTPN11S1PR3CES2CES1
SCHEMBL5862942 0.82 PTPN11 (0.39) WDR5PTPN11S1PR3NR1I2LMNA
SCHEMBL5862965 0.82 PTPN11 (0.41) PTPN11S1PR3NR1I2ALDH1A1HPGD
SCHEMBL5843262 0.81 S1PR3 (0.41) WDR5PTPN11S1PR3CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 WDR5 3918/4885S1PR5 3094/4885PTPN11 61/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.