SCHEMBL5862965

SCHEMBL5862965

CCCCCCOc1ccc(C(C)(C)C)cc1S(=O)(=O)C(=[N+]=[N-])C(=O)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PTPN11 Q06124 2/20 0.41
S1PR3 Q99500 4/20 0.40
THRA P10827 2/20 0.40
THRB P10828 2/20 0.40
MRGPRX4 Q96LA9 1/20 0.39
ALDH1A1 P00352 1/20 0.38
HPGD P15428 1/20 0.38
PLA2G2D Q9UNK4 1/20 0.38
KDM4E B2RXH2 1/20 0.38
GAA P10253 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
LTB4R Q15722 2/20 0.38
S1PR1 P21453 2/20 0.38
NR1I2 O75469 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5862942 0.99 PTPN11 (0.39) PTPN11S1PR3THRATHRBMRGPRX4
SCHEMBL5862002 0.96 NR1I2 (0.41) PTPN11MRGPRX4ALDH1A1KDM4EGAA
SCHEMBL5862941 0.90 PTPN1 (0.40) THRATHRBALDH1A1HPGD
SCHEMBL5861730 0.89 PTPN1 (0.39) THRATHRBNR1I2
SCHEMBL5862527 0.88 PTPN11 (0.42) PTPN11S1PR3THRATHRBALDH1A1
SCHEMBL5862927 0.87 PTPN11 (0.40) PTPN11S1PR3THRATHRBALDH1A1
SCHEMBL5845465 0.87 PLA2G4B (0.43) PTPN11S1PR3
SCHEMBL5861735 0.86 THRA (0.40) S1PR3THRATHRBALDH1A1HPGD
SCHEMBL5862983 0.86 ENPP1 (0.39) THRATHRBGAANR1I2
SCHEMBL5862532 0.85 SMN1; SMN2 (0.39) S1PR3THRATHRBALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 PTPN11 54/4885S1PR3 2134/4885THRA 2769/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.