SCHEMBL5844724

SCHEMBL5844724

CCCCOc1cc2ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C3CCCCC3)cc2cc1OCCCC

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.37
MAPK1 P28482 1/20 0.37
RECQL P46063 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PTGES O14684 1/20 0.34
ALOX5 P09917 1/20 0.34
BCHE P06276 1/20 0.34
ALDH1A1 P00352 2/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
LMNA P02545 1/20 0.34
GAA P10253 1/20 0.34
CNR2 P34972 4/20 0.33
PPARG P37231 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
PTGS2 P35354 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5881892 0.92 TSHR (0.40) TSHRMAPK1RECQLL3MBTL1PTGES
SCHEMBL5844949 0.91 PPARG (0.38) TSHRMAPK1RECQLL3MBTL1PTGES
SCHEMBL5881654 0.89 THRA (0.39) TSHRMAPK1RECQLL3MBTL1BCHE
SCHEMBL5844396 0.87 CA12 (0.41) TSHRMAPK1RECQLL3MBTL1CA12
SCHEMBL5843709 0.86 BCHE (0.39) TSHRMAPK1RECQLL3MBTL1PTGES
SCHEMBL5844003 0.84 S1PR3 (0.43) TSHRCA12CA1CA2CA7
SCHEMBL6739607 0.83 TSHR (0.44) TSHRMAPK1RECQLL3MBTL1ALDH1A1
SCHEMBL6736211 0.83 TSHR (0.44) TSHRMAPK1RECQLL3MBTL1ALDH1A1
SCHEMBL5843439 0.82 S1PR3 (0.44) TSHRCA12CA1CA2CA7
SCHEMBL5845206 0.82 S1PR3 (0.44) TSHRCA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 TSHR 2355/4885MAPK1 329/4885RECQL 4534/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.