SCHEMBL5845159

SCHEMBL5845159

CCCCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2ccccc2C)c(OCCCCCC)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDIA6 Q15084 1/20 0.40
PTPN11 Q06124 1/20 0.39
THRA P10827 3/20 0.38
THRB P10828 3/20 0.38
PLA2G4B P0C869 2/20 0.37
PTGES O14684 1/20 0.36
ALOX5 P09917 1/20 0.36
PPARG P37231 1/20 0.36
PPARA Q07869 1/20 0.36
MEN1 O00255 1/20 0.36
NR1I2 O75469 1/20 0.36
LMNA P02545 1/20 0.36
CHRM2 P08172 1/20 0.36
CYP3A4 P08684 1/20 0.36
ADRA2A P08913 1/20 0.36
MAPT P10636 1/20 0.36
OPRK1 P41145 1/20 0.36
HTR2B P41595 1/20 0.36
SLC6A3 Q01959 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5843955 0.92 THRA (0.39) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5843706 0.91 THRA (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5845150 0.91 THRA (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5843430 0.91 THRA (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5844520 0.91 THRA (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5844024 0.91 THRA (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5843877 0.90 PDIA6 (0.42) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5845171 0.90 MEN1 (0.38) PDIA6PTPN11THRATHRBPLA2G4B
SCHEMBL5843560 0.88 NPC1 (0.41) PDIA6THRATHRBPTGESALOX5
SCHEMBL5845439 0.87 KAT6A (0.41) PDIA6PTPN11THRATHRBPLA2G4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 PDIA6 1899/4885PTPN11 61/4885THRA 1957/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.