⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5848287 | 0.88 | — | — | |
| SCHEMBL7506117 | 0.85 | — | — | |
| SCHEMBL7654231 | 0.80 | — | — | |
| SCHEMBL53268 | 0.79 | — | — | |
| SCHEMBL5090581 | 0.78 | — | — | |
| SCHEMBL11042215 | 0.78 | — | — | |
| SCHEMBL924416 | 0.77 | NPC1 (0.33) | — | |
| SCHEMBL8576084 | 0.77 | NPC1 (0.33) | — | |
| SCHEMBL6285902 | 0.75 | — | — | |
| SCHEMBL5364951 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7071053-B2 | Method of forming capacitor with ruthenium top and bottom electrodes by MOCVD | HITACHI, LTD. (JP) | 2006-07-04 | — | — | US | disclosed |
| US-6821845-B1 | Semiconductor device and method for manufacturing the same | HITACHI, LTD. (JP) | 2004-11-23 | — | — | US | disclosed |
| US-20040214392-A1 | Semiconductor device and manufacturing method thereof | NABATAME TOSHIHIDE (JP) | 2004-10-28 | — | — | US | disclosed |