SCHEMBL7654231

SCHEMBL7654231

CCCCCC1=C([Ru]C2=CC=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7506117 0.95
SCHEMBL16991099 0.89
SCHEMBL7648397 0.84
SCHEMBL5848919 0.80
SCHEMBL5848287 0.73
SCHEMBL4025291 0.70
SCHEMBL7906771 0.70
SCHEMBL10416028 0.70 ACHE (0.32)
SCHEMBL53268 0.68
SCHEMBL28897945 0.68 ACHE (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6476247-B1 Processes for the preparation of organoluthenium compounds useful for thin film formation by CVD TANAKA KIKINZOKU KOGYO K.K. (JP) 2002-11-05 US claimed
US-6476247-B1 Processes for the preparation of organoluthenium compounds useful for thin film formation by CVD TANAKA KIKINZOKU KOGYO K.K. (JP) 2002-11-05 US disclosed
US-6476247-B1 Processes for the preparation of organoluthenium compounds useful for thin film formation by CVD TANAKA KIKINZOKU KOGYO K.K. (JP) 2002-11-05 US disclosed
JP-2002114796-A RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION AND METHOD FOR CHEMICAL VAPOR DEPOSITION OF RUTHENIUM THIN FILM OR RUTHENIUM COMPOUND THIN FILM TANAKA KIKINZOKU KOGYO KK 2002-04-16 JP disclosed
JP-2001172294-A METHOD FOR PRODUCING (ALKYLCYCLOPENTADIENYL) CYCLOPENTADIENYLRUTHENIUM, THE SAME COMPOUND PRODUCED BY THE SAME METHOD AND METHOD FOR PRODUCING THIN MEMBRANE USING THE SAME COMPOUND AS RAW MATERIAL TANAKA KIKINZOKU KOGYO KK 2001-06-26 JP disclosed