⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL28664970 | 0.96 | — | — | |
| SCHEMBL5278369 | 0.88 | — | — | |
| SCHEMBL9310273 | 0.88 | THRB (0.33) | — | |
| SCHEMBL29144410 | 0.85 | — | — | |
| SCHEMBL11830766 | 0.84 | TDP1 (0.34) | — | |
| SCHEMBL11215657 | 0.83 | — | — | |
| SCHEMBL17160046 | 0.83 | — | — | |
| SCHEMBL4079128 | 0.83 | TYR (0.37) | — | |
| SCHEMBL9310057 | 0.82 | THRB (0.33) | — | |
| SCHEMBL59712 | 0.81 | GABRA1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 467 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119242118-A | Method for preparing GMA (GMA-type acrylic resin) for powder coating in biomass solvent | 安徽工程大学 | 2025-01-03 | — | — | CN | claimed |
| CN-116640260-A | Anti-indentation acrylic resin and synthetic method thereof | 六安捷通达新材料有限公司 | 2023-08-25 | — | — | CN | claimed |
| CN-116515050-A | High heat-resistant carboxyl acrylic resin for powder coating and synthetic method thereof | 安徽科瑞达新材料有限公司 | 2023-08-01 | — | — | CN | claimed |
| CN-115167078-A | Positive photoresist composition, cured film and synthesis method thereof | 漳州思美科新材料有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-113671795-B | Positive photoresist composition with high residual film rate, synthetic method and cured film thereof | 深圳迪道微电子科技有限公司 | 2022-05-24 | — | — | CN | claimed |
| CN-113671795-A | High residual film rate positive photoresist composition and its synthesis method and cured film | 深圳迪道微电子科技有限公司 | 2021-11-19 | — | — | CN | claimed |
| CN-113641081-A | High-adhesion positive photoresist composition, synthesis method thereof and cured film | 深圳迪道微电子科技有限公司 | 2021-11-12 | — | — | CN | claimed |
| EP-1627664-A1 | Hair styling composition comprising adhesive particles and non-adhesive particles | L'OREAL (FR) | 2006-02-22 | — | — | EP | claimed |
| US-20060024255-A1 | Hair styling compositions comprising adhesive particles and non-adhesive particles | L'ORÉAL (FR) | 2006-02-02 | — | — | US | claimed |
| EP-4749682-A1 | CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-27 | — | — | EP | disclosed |
| CN-122071546-A | Curable composition, film forming method, and method for producing product | 佳能株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-20260140445-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-21 | — | — | US | disclosed |
| EP-4743311-A1 | PHENOL-FREE, HEAT-SENSITIVE RECORDING MATERIAL | Oji Holdings Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-12629718-B2 | Film forming method and article manufacturing method | CANON KABUSHIKI KAISHA (JP) | 2026-05-19 | — | — | US | disclosed |
| US-4933253-A | EASE OF CLEANING | FUJI XEROX CO., LTD. (JP) | 1990-06-12 | — | — | US | disclosed |
| US-4929528-A | TRIFLUOROETHYLENE-VINYLIDENE FLUORIDE COPOLYMER, ELECTROGRAPHY | FUJI XEROX CO., LTD. (JP) | 1990-05-29 | — | — | US | disclosed |
| US-4868083-A | Developer carrier and process for producing the same | FUJI XEROX CO., LTD. (JP) | 1989-09-19 | — | — | US | disclosed |
| US-4791041-A | FLUORINATED ALKYL (METH)ARYLATE COPOLYMER OVERCOATINGS; ANTISOILANTS; ANTISTICKING AGENTS | FUJI XEROX CO., LTD. (JP) | 1988-12-13 | — | — | US | disclosed |
| EP-0283938-A1 | Silver halide color photographic material | Fuji Photo Film Co., Ltd. (JP) | 1988-09-28 | — | — | EP | disclosed |
| EP-0248421-A2 | Carrier for developer | FUJI XEROX CO., LTD. (JP) | 1987-12-09 | — | — | EP | disclosed |