SCHEMBL585335

SCHEMBL585335

CC(C(=O)O)=C(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.52
CES2 O00748 4/20 0.52
TSHR P16473 3/20 0.48
ALDH1A1 P00352 2/20 0.48
DAO P14920 1/20 0.48
NAPRT Q6XQN6 1/20 0.48
CYP19A1 P11511 2/20 0.47
ESR1 P03372 1/20 0.45
MAPT P10636 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
POLB P06746 1/20 0.44
CYP3A4 P08684 1/20 0.44
PARP1 P09874 1/20 0.44
CYP2C19 P33261 1/20 0.44
RECQL P46063 1/20 0.44
BLM P54132 1/20 0.44
PMP22 Q01453 1/20 0.44
HSD17B10 Q99714 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
CA12 O43570 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL5955924 0.91 CES1 (0.45) CES1CES2TSHRALDH1A1DAO
Propene SCHEMBL28911289 0.89 AKT1 (0.47) CES1CES2TSHRALDH1A1DAO
SCHEMBL17802336 0.88 MEN1 (0.50) CES1CES2ALDH1A1CYP19A1MAPT
SCHEMBL17802360 0.88 NPC1 (0.46) CES1CES2ALDH1A1CYP19A1MAPT
Acrylic Acid SCHEMBL28545528 0.88 AKT1 (0.50) CES1CES2TSHRALDH1A1DAO
SCHEMBL17802344 0.88 CES2 (0.59) CES1CES2TSHRCYP19A1MAPT
SCHEMBL1232452 0.82 CES1 (0.54) CES1CES2TSHRALDH1A1DAO
SCHEMBL367453 0.82 CES1 (0.54) CES1CES2TSHRALDH1A1DAO
SCHEMBL367456 0.82 CES1 (0.54) CES1CES2TSHRALDH1A1DAO
SCHEMBL6299542 0.82 CES2 (0.61) CES1CES2ALDH1A1PARP1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3250655-B1 ANAEROBIC CURABLE COMPOSITIONS HENKEL AG & CO KGAA (DE) 2024-05-15 EP claimed
CN-107148411-B Phenylhydrazine/anhydride adducts and anaerobically curable compositions using phenylhydrazine/anhydride adducts 汉高知识产权控股有限责任公司 2020-06-19 CN claimed
EP-2807224-B1 TWO-PART, CYANOACRYLATE/FREE RADICALLY CURABLE ADHESIVE SYSTEMS Henkel IP & Holding GmbH (DE) 2020-05-13 EP claimed
EP-3289031-B1 ANAEROBIC CURABLE COMPOSITIONS Henkel IP & Holding GmbH (DE) 2020-03-04 EP claimed
CN-110327219-A A kind of high-strength tooth family resin for restoration of organic/inorganic hybrid filler filling 东华大学 2019-10-15 CN claimed
EP-3209640-B1 PHENYLHYDRAZINE/ANHYDRIDE ADDUCTS AND ANAEROBIC CURABLE COMPOSITIONS USING SAME Henkel IP & Holding GmbH (DE) 2019-07-10 EP claimed
CN-109453034-A A kind of antibacterial gear division reparation compound resin and its preparation and application 东华大学 2019-03-12 CN claimed
EP-3209702-B1 ANAEROBIC CURABLE COMPOSITIONS HAVING NOVOLAC VINYL ESTERS Henkel IP & Holding GmbH (DE) 2018-12-12 EP claimed
CN-107001589-B Anaerobically curable compositions comprising phenolic vinyl esters 汉高知识产权控股有限责任公司 2018-11-27 CN claimed
CN-108652984-A A kind of hydroxyapatite nanofiber enhancing silicon substrate gear division reparation compound resin and preparation method thereof 东华大学 2018-10-16 CN claimed
CN-102219439-A Chemical two component mortar composition with improved adhesion to the surface of semi-purified and/or wet bore holes in mineral base and use of same HILTI AG 2011-10-19 CN claimed
CN-101827870-A Novel adducts useful as cure components for anaerobic curable compositions HENKEL CORP 2010-09-08 CN claimed
US-7520933-B2 Method for manufacturing colloidal crystals via confined convective assembly KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2009-04-21 US claimed
US-20090087753-A1 VOLUME PHASE HOLOGRAM RECORDING MATERIAL, PRODUCTION PROCESS THEREFOR, AND RECORDED MATERIAL TOAGOSEI CO., LTD. (JP) 2009-04-02 US claimed
US-20090022894-A1 Thermally Resistant Anaerobically Curable Compositions HENKEL CORPORATION (US) 2009-01-22 US claimed
US-20080053369-A1 Method for manufacturing colloidal crystals via confined convective assembly KOREAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2008-03-06 US claimed
CN-1950728-A Polarized and abrasion-resistant optical article and process for manufacturing thereof ESSILOR INT (FR) 2007-04-18 CN claimed
EP-0158357-B1 METHOD OF FORMING RESIST MICROPATTERN NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1991-02-27 EP claimed
US-4634645-A FORMING RECESSED PATTERN WITH ENERGY BEAM NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1987-01-06 US claimed
EP-0158357-A2 Method of forming resist micropattern NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1985-10-16 EP claimed