Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DAO | P14920 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | CASP3 | P42574 | 2/20 | 0.34 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.34 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.34 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 3/20 | 0.33 |
| ▸ | KDR | P35968 | 3/20 | 0.32 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.32 |
| ▸ | GSK3B | P49841 | 3/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | RAF1 | P04049 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10384202 | 0.81 | DAO (0.49) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL13246741 | 0.81 | DAO (0.61) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL8176992 | 0.79 | DAO (0.59) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL8111560 | 0.79 | DAO (0.59) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL10384320 | 0.77 | DAO (0.44) | DAOCASP3SENP7SENP8SENP6 | |
| SCHEMBL10384771 | 0.76 | HDAC6 (0.63) | HDAC6HDAC4 | |
| SCHEMBL7253264 | 0.76 | DAO (0.59) | DAOCASP3SENP7SENP8SENP6 | |
| SCHEMBL7514103 | 0.74 | DAO (0.52) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL7514096 | 0.74 | DAO (0.52) | DAOMAPTNPSR1CASP3SENP7 | |
| SCHEMBL10274823 | 0.73 | DAO (0.61) | DAOMAPTNPSR1CASP3SENP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | claimed |
| WO-2025057864-A1 | ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME | ＴＯＰＰＡＮホールディングス株式会社 | 2025-03-20 | — | — | WO | disclosed |
| US-12210285-B2 | Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device | TORAY INDUSTRIES, INC. (JP) | 2025-01-28 | — | — | US | disclosed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-117882497-A | Adhesive film for circuit connection, circuit connection structure, and method for producing same | 株式会社力森诺科 | 2024-04-12 | — | — | CN | disclosed |
| US-11650499-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11599023-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-03-07 | — | — | US | disclosed |
| WO-2023276889-A1 | ADHESIVE FILM FOR CONNECTING CIRCUIT, CIRCUIT CONNECTION STRUCTURE, AND METHOD FOR MANUFACTURING SAME | 昭和電工マテリアルズ株式会社 | 2023-01-05 | — | — | WO | disclosed |
| US-11512204-B2 | Squarylium dye and composition containing same | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2022-11-29 | — | — | US | disclosed |
| US-20220275241-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL | SHOWA DENKO K.K. (JP) | 2022-09-01 | — | — | US | disclosed |
| US-20080286690-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. | 2008-11-20 | — | — | US | disclosed |
| US-20080239045-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| EP-1975210-A1 | Ink set for inkjet recording and inkjet recording method | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |
| EP-1958994-A1 | Ink set for inkjet recording and inkjet recording method | FUJIFILM Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | SHOWA DENKO K.K. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1805137-B1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KK (JP) | 2008-03-26 | — | — | EP | disclosed |
| EP-1805137-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-07-11 | — | — | EP | disclosed |
| WO-2006046736-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. (JP) | 2006-05-04 | — | — | WO | disclosed |
| US-4960746-A | A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE | CIBA-GEIGY CORPORATION (US) | 1990-10-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | TST, TMT1A, CRY1 | DAO 850/4885MAPT 658/4885NPSR1 1829/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.