Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TBXAS1 | P24557 | 7/20 | 0.55 |
| ▸ | DGKA | P23743 | 1/20 | 0.51 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.50 |
| ▸ | TLR2 | O60603 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10653577 | 0.99 | TBXAS1 (0.58) | TBXAS1DGKATBXA2RTLR2SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL11828470 | 0.97 | TBXAS1 (0.56) | TBXAS1DGKATBXA2RTLR2SMN1; SMN2 | |
| SCHEMBL47381 | 0.87 | TBXAS1 (0.58) | TBXAS1TBXA2RTLR2SMN1; SMN2HTT | |
| SCHEMBL45905 | 0.87 | TBXAS1 (0.54) | TBXAS1SMN1; SMN2HTTMAPK1EGLN3 | |
| SCHEMBL3690128 | 0.84 | TBXAS1 (0.53) | TBXAS1DGKATBXA2RTLR2ALDH1A1 | |
| SCHEMBL27782849 | 0.84 | EGLN3 (0.56) | TBXAS1EGLN3CYP19A1KDM4EALDH1A1 | |
| SCHEMBL10072238 | 0.83 | TBXAS1 (0.59) | TBXAS1SMN1; SMN2EGLN3LMNAKDM4E | |
| SCHEMBL27059646 | 0.83 | MGLL (0.54) | TBXAS1TLR2SMN1; SMN2HTTMAPK1 | |
| SCHEMBL12304848 | 0.82 | TBXAS1 (0.52) | TBXAS1EGLN3LMNAKDM4EALDH1A1 | |
| SCHEMBL14499226 | 0.82 | TBXAS1 (0.60) | TBXAS1EGLN3LMNAKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7141351-B2 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20040234884-A1 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-25 | — | — | US | disclosed |