⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6660583 | 0.94 | — | — | |
| SCHEMBL7782089 | 0.80 | — | — | |
| SCHEMBL1605794 | 0.79 | CA14 (0.30) | — | |
| SCHEMBL11171002 | 0.79 | LMNA (0.34) | — | |
| SCHEMBL28442040 | 0.78 | — | — | |
| SCHEMBL561280 | 0.78 | — | — | |
| SCHEMBL29174089 | 0.77 | THRB (0.41) | — | |
| SCHEMBL962544 | 0.77 | — | — | |
| SCHEMBL14524583 | 0.75 | CDC25A (0.31) | — | |
| SCHEMBL581055 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | disclosed |
| US-7419611-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-02 | — | — | US | disclosed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | disclosed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | disclosed |