SCHEMBL5862604

SCHEMBL5862604

CCCN1C(=O)C2C3C=CC(C3)C2C1=O

nearest known ligand 0.72

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.72
KMT2A Q03164 3/20 0.70
MEN1 O00255 2/20 0.70
RAB9A P51151 2/20 0.70
KDM4E B2RXH2 1/20 0.67
HTT P42858 2/20 0.64
TSHR P16473 2/20 0.64
USP2 O75604 1/20 0.64
HSD17B10 Q99714 1/20 0.64
MAPK1 P28482 2/20 0.62
SMN1; SMN2 Q16637 5/20 0.58
LMNA P02545 1/20 0.58
L3MBTL1 Q9Y468 2/20 0.56
TDP1 Q9NUW8 1/20 0.52
PKM P14618 1/20 0.51
CYP1A2 P05177 1/20 0.51
CYP3A4 P08684 1/20 0.51
CYP2C19 P33261 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11529889 0.89 ALDH1A1 (0.79) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL14344292 0.88 ALDH1A1 (0.84) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL13528565 0.88 ALDH1A1 (0.84) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL11594277 0.87 ALDH1A1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL11592112 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL16231138 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL17300529 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL10625208 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL11533142 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL11528094 0.86 MEN1 (0.83) ALDH1A1KMT2AMEN1RAB9AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4080491-A CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE SHOWA DENKO K.K. (JA) 1978-03-21 US claimed
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
CN-108885398-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2022-11-29 CN disclosed
EP-2781553-A1 SILANE-CONTAINING COMPOSITION, CURABLE RESIN COMPOSITION, AND SEALING MATERIAL Nippon Shokubai Co., Ltd. (JP) 2014-09-24 EP disclosed
US-7049220-B2 Method of forming cavity between multilayered wirings JSR CORPORATION (JP) 2006-05-23 US disclosed
US-20040132243-A1 Method of forming cavity between multilayered wirings JSR CORPORATION (JP) 2004-07-08 US disclosed
EP-1416528-A2 Method of forming cavity between multilayered wirings JSR Corporation (JP) 2004-05-06 EP disclosed
US-4176220-A COORDINATION CATALYST JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1979-11-27 US disclosed
US-4080491-A CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE SHOWA DENKO K.K. (JA) 1978-03-21 US disclosed
US-4068063-A Catalyst composition for ring-opening polymerization of norbornene derivatives and process for polymerizing same JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1978-01-10 US disclosed
US-4011386-A RING OPENING, POLYALKENAMERS JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1977-03-08 US disclosed