SCHEMBL5862996

SCHEMBL5862996

CCCCCCOc1ccc(C)cc1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c1ccc2ccccc2c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR3 Q99500 1/20 0.39
CNR1 P21554 2/20 0.38
CNR2 P34972 2/20 0.38
RAPGEF3 O95398 1/20 0.38
PPARG P37231 2/20 0.37
PPARA Q07869 2/20 0.37
GAA P10253 2/20 0.36
CYP2C9 P11712 1/20 0.36
CETP P11597 1/20 0.36
POLB P06746 1/20 0.35
PTPN1 P18031 1/20 0.35
THRA P10827 1/20 0.35
THRB P10828 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TP53 P04637 1/20 0.35
MAPT P10636 1/20 0.35
FABP4 P15090 5/20 0.35
FABP5 Q01469 5/20 0.35
TLR8 Q9NR97 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5861991 0.99 RAPGEF3 (0.38) S1PR3CNR1CNR2RAPGEF3PPARG
SCHEMBL5862339 0.96 RAPGEF3 (0.41) CNR1CNR2RAPGEF3GAACETP
SCHEMBL5861677 0.89 PTPN1 (0.39) S1PR3CNR1CNR2PPARGPPARA
SCHEMBL5862344 0.88 POLB (0.43) S1PR3GAAPOLBTHRATHRB
SCHEMBL5862976 0.88 POLB (0.43) S1PR3GAAPOLBTHRATHRB
SCHEMBL5862493 0.88 POLB (0.43) S1PR3GAAPOLBTHRATHRB
SCHEMBL5861561 0.88 POLB (0.43) S1PR3GAAPOLBTHRATHRB
SCHEMBL5861614 0.88 PTPN1 (0.38) S1PR3CNR1CNR2PPARGPPARA
SCHEMBL5862511 0.87 POLB (0.44) S1PR3GAAPOLBTHRATHRB
SCHEMBL5862340 0.85 GAA (0.37) CNR1CNR2RAPGEF3GAACETP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 S1PR3 2134/4885CNR1 2620/4885CNR2 2228/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.