SCHEMBL5866191

SCHEMBL5866191

CCCCCCCCS(=O)(=O)[O-].CCCCOc1ccc([S+]2CCCC2)c2ccccc12

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 2/20 0.43
CNR1 P21554 3/20 0.39
CNR2 P34972 3/20 0.39
GAA P10253 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
THRA P10827 1/20 0.38
THRB P10828 1/20 0.38
CYP2C9 P11712 1/20 0.38
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
HTT P42858 2/20 0.37
FABP4 P15090 6/20 0.36
FABP5 Q01469 6/20 0.36
S1PR3 Q99500 1/20 0.34
MCOLN3 Q8TDD5 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5866228 0.94 TSHR (0.41) SLC2A1CNR1CNR2GAATDP1
SCHEMBL5866213 0.90 HTT (0.38) SLC2A1CNR2HTTALDH1A1LMNA
SCHEMBL8737935 0.86 CNR1 (0.47) SLC2A1CNR1CNR2GAATDP1
SCHEMBL8736285 0.86 CNR1 (0.47) SLC2A1CNR1CNR2GAATDP1
SCHEMBL2742104 0.86 CNR1 (0.47) SLC2A1CNR1CNR2GAATDP1
SCHEMBL106524 0.86 CNR1 (0.45) SLC2A1CNR1CNR2GAATDP1
SCHEMBL29429149 0.86 CNR1 (0.45) SLC2A1CNR1CNR2GAATDP1
SCHEMBL3883692 0.86 SLC2A1 (0.42) SLC2A1CNR1CNR2GAATDP1
Trifluoromethanesulfonic Acid SCHEMBL36280 0.86 SLC2A1 (0.42) SLC2A1CNR1CNR2GAATDP1
Trifluoromethanesulfonic Acid SCHEMBL29354733 0.86 SLC2A1 (0.42) SLC2A1CNR1CNR2GAATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7144675-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-12-05 US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20040048192-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-03-11 US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 US disclosed