Methylmalonic Acid

Methylmalonic Acid

SCHEMBL5874121

CC(C(=O)O)C(=O)O.CC(O)N(C(C)O)C(C)O

nearest known ligand 0.65

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.47
TSHR P16473 1/20 0.35
SLC7A5 Q01650 1/20 0.33
POLB P06746 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
FOLH1 Q04609 2/20 0.30
NAALAD2 Q9Y3Q0 2/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lactic Acid SCHEMBL21219127 0.85 TP53 (0.69) TP53TSHRSLC7A5POLBCYP2D6
Bicarbonate SCHEMBL5874276 0.84 TP53 (0.47) TP53TSHRSLC7A5POLBCYP2D6
Cadaverine Tartrate SCHEMBL5874851 0.82 TSHR (0.59) TP53TSHRSLC7A5POLBCYP2C19
Acetic Acid SCHEMBL5874694 0.81 FFAR3 (0.47) TP53TSHRPOLBCYP2D6CYP2C19
Oxalic Acid SCHEMBL5875009 0.81 TP53 (0.44) TP53TSHRPOLBCYP2D6CYP2C19
Methylmalonic Acid SCHEMBL27881917 0.80 TP53 (0.57) TP53TSHRSLC7A5ALDH1A1
Methylmalonic Acid SCHEMBL27766 0.80
Dichloroacetic Acid SCHEMBL5874749 0.80 LMNA (0.56) TP53TSHRSLC7A5POLBALDH1A1
Alanine SCHEMBL26121081 0.80 TP53 (0.45) TP53TSHRSLC7A5ALDH1A1
Methylmalonic Acid SCHEMBL5875173 0.78 TP53 (0.47) TP53TSHRSLC7A5ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed