Dichloroacetic Acid

Dichloroacetic Acid

SCHEMBL5874158

CC(O)NC(C)O.O=C(O)C(Cl)Cl

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

PDK1PDK2PDK3PDK4

The experimentally established mechanism targets of Dichloroacetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.56
TP53 P04637 1/20 0.45
ALDH1A1 P00352 2/20 0.36
TSHR P16473 1/20 0.33
SLC7A5 Q01650 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lactic Acid SCHEMBL1832719 0.82 TP53 (0.69) TP53ALDH1A1TSHRSLC7A5
Bicarbonate SCHEMBL1832823 0.82 TP53 (0.47) LMNATP53ALDH1A1TSHRSLC7A5
Dichloroacetic Acid SCHEMBL9560991 0.82 LMNA (0.71) LMNATP53ALDH1A1TSHRSLC7A5
Cadaverine Tartrate SCHEMBL1835488 0.80 TSHR (0.59) LMNATP53ALDH1A1TSHRSLC7A5
Methylmalonic Acid SCHEMBL5874135 0.80 TP53 (0.47) TP53TSHRSLC7A5
Dichloroacetic Acid SCHEMBL316728 0.80 LMNA (0.59) LMNATP53ALDH1A1SLC7A5
Dichloroacetic Acid SCHEMBL28479696 0.79 LMNA (0.67) LMNATP53ALDH1A1TSHRSLC7A5
Acetic Acid SCHEMBL1831396 0.79 FFAR3 (0.47) TP53ALDH1A1TSHR
Oxalic Acid SCHEMBL1834268 0.79 TP53 (0.44) LMNATP53ALDH1A1TSHR
Dichloroacetic Acid SCHEMBL5874749 0.78 LMNA (0.56) LMNATP53ALDH1A1TSHRSLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed