SCHEMBL5874316

SCHEMBL5874316

CCCCCC(=O)ON1CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GNAI3 P08754 6/20 0.50
GNAO1 P09471 6/20 0.50
GNAI1 P63096 6/20 0.50
DGKA P23743 1/20 0.43
HRH2 P25021 1/20 0.42
HRH1 P35367 1/20 0.42
SIGMAR1 Q99720 1/20 0.42
NAAA Q02083 3/20 0.41
LMNA P02545 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
FAAH O00519 1/20 0.41
PAM P19021 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MAPT P10636 1/20 0.39
MAPK1 P28482 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5875013 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5874516 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5875251 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5874232 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5874398 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL27513970 0.97 GNAI3 (0.51) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5874088 0.95 GNAI3 (0.44) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL1642959 0.91 GNAI3 (0.38) GNAI3GNAO1GNAI1HRH2HRH1
SCHEMBL11336930 0.90 GNAI3 (0.44) GNAI3GNAO1GNAI1DGKAHRH2
SCHEMBL5874362 0.90 TERT (0.47) GNAI3GNAO1GNAI1DGKALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104487449-A Cyclosporin A analogs ALLERGAN INC 2015-04-01 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed