Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.73 |
| ▸ | TSHR | P16473 | 5/20 | 0.69 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.69 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.69 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.63 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.62 |
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.60 |
| ▸ | PPARG | P37231 | 7/20 | 0.60 |
| ▸ | PPARD | Q03181 | 7/20 | 0.60 |
| ▸ | PPARA | Q07869 | 7/20 | 0.60 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.60 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.60 |
| ▸ | TLR2 | O60603 | 2/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.60 |
| ▸ | FABP4 | P15090 | 2/20 | 0.60 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.60 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.60 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.60 |
| ▸ | MEN1 | O00255 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adipic Acid SCHEMBL5874433 | 1.00 | LMNA (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Sebacic Acid SCHEMBL5874525 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Azelaic Acid SCHEMBL9641849 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Azelaic Acid SCHEMBL17765503 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Sebacic Acid SCHEMBL5874520 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Dimethylamine SCHEMBL28823028 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Glutarate SCHEMBL5874409 | 0.93 | SLC22A6 (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Glutarate SCHEMBL5874404 | 0.93 | SLC22A6 (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Hexanoate SCHEMBL3715402 | 0.89 | AKR1B1 (0.84) | LMNATSHRAKR1B1SLC22A6GPR84 | |
| Stearic Acid SCHEMBL29694487 | 0.87 | GPR84 (0.85) | LMNATSHRAKR1B1SLC22A6GPR84 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12176156-B2 | Electrolytic capacitor for high withstand voltage | RUBYCON CORPORATION (JP) | 2024-12-24 | — | — | US | claimed |
| CN-117038338-A | Electrolytic capacitor | 路碧康株式会社 | 2023-11-10 | — | — | CN | claimed |
| US-20220319779-A1 | ELECTROLYTIC CAPACITOR | RUBYCON CORPORATION (JP) | 2022-10-06 | — | — | US | claimed |
| CN-113994445-A | Electrolytic capacitor | 路碧康株式会社 | 2022-01-28 | — | — | CN | claimed |
| US-12176156-B2 | Electrolytic capacitor for high withstand voltage | RUBYCON CORPORATION (JP) | 2024-12-24 | — | — | US | disclosed |
| CN-117038338-A | Electrolytic capacitor | 路碧康株式会社 | 2023-11-10 | — | — | CN | disclosed |
| US-20220319779-A1 | ELECTROLYTIC CAPACITOR | RUBYCON CORPORATION (JP) | 2022-10-06 | — | — | US | disclosed |
| CN-113994445-A | Electrolytic capacitor | 路碧康株式会社 | 2022-01-28 | — | — | CN | disclosed |
| CN-112654363-A | Tissue-specific WNT signal enhancing molecules and uses thereof | 瑟罗泽恩公司 | 2021-04-13 | — | — | CN | disclosed |
| CN-108500511-A | The manufacturing method of flux composition, solder composition, electric substrate and electric substrate | 株式会社田村制作所 | 2018-09-07 | — | — | CN | disclosed |
| CN-103275819-A | Water bath cleaning agent used for full-automatic biochemical analyzer and preparation method of water bath cleaning agent | SUZHOU KANGHESHUN MEDICAL TECHNOLOGY CO LTD | 2013-09-04 | — | — | CN | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |