Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol
The experimentally established mechanism targets of Maleic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.69 |
| ▸ | TP53 | P04637 | 1/20 | 0.69 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.69 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.69 |
| ▸ | HCAR2 | Q8TDS4 | 5/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | GABRP | O00591 | 2/20 | 0.41 |
| ▸ | GABRD | O14764 | 2/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.41 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.41 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.41 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.41 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.41 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.41 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fumaric Acid SCHEMBL5875144 | 1.00 | TSHR (0.69) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Fumaric Acid SCHEMBL5875151 | 1.00 | TSHR (0.69) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Fumaric Acid SCHEMBL5874539 | 1.00 | TSHR (0.69) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL5874530 | 1.00 | TSHR (0.69) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Fumaric Acid SCHEMBL5874534 | 1.00 | TSHR (0.69) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL30625964 | 0.96 | TSHR (0.64) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL4926762 | 0.96 | TSHR (0.64) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL29087113 | 0.88 | — | — | |
| Maleic Acid SCHEMBL28218264 | 0.87 | TSHR (0.53) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL28080369 | 0.87 | TSHR (0.53) | TSHRTP53EGLN1EGLN3HCAR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118064880-A | Corrosion-resistant chemical nickel plating solution and preparation method thereof | 德星化工(苏州)有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-119462685-A | Arteannuin derivative and application thereof in treating cerebral apoplexy | 上海英诺富成生物科技有限公司 | 2025-02-18 | — | — | CN | disclosed |
| CN-116814236-B | Reservoir reforming fluid for tight oil reservoir and pressure flooding integrated yield increasing method | 四川申和新材料科技有限公司 | 2025-02-14 | — | — | CN | disclosed |
| CN-118064880-A | Corrosion-resistant chemical nickel plating solution and preparation method thereof | 德星化工(苏州)有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-117223076-A | Electrochemical device and method for manufacturing the same | 松下知识产权经营株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-116814236-A | Reservoir reforming fluid for tight oil reservoir and pressure flooding integrated yield increasing method | 四川申和新材料科技有限公司 | 2023-09-29 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-RE45994-E1 | Electrolytic capacitor and its manufacturing method | PANASONIC CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| EP-0938108-B1 | Electrolytic capacitor and its manufacturing method | PANASONIC CORP (JP) | 2015-04-08 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-6962612-B1 | Solid organic conductor is organic conductive polymer polymerized and bonded to surface of positive electrode; good impedance, small current leak, reliable, high dielectric strength. | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-11-08 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6307735-B1 | Electrolytic capacitor and its manufacturing method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-10-23 | — | — | US | disclosed |
| EP-0938108-A2 | Electrolytic capacitor and its manufacturing method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1999-08-25 | — | — | EP | disclosed |