SCHEMBL5874532

SCHEMBL5874532

CC(C(=O)O[n+]1ccccc1)C(=O)O[n+]1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
HTT P42858 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5875218 0.79
SCHEMBL3777629 0.77 LMNA (0.33) LMNA
SCHEMBL175986 0.73 ALDH1A1 (0.32) ALDH1A1
Hydrochloric Acid SCHEMBL9655998 0.72 TSHR (0.41) ALDH1A1LMNA
SCHEMBL5875157 0.72
SCHEMBL5874788 0.72
Ammonia Solution, Strong SCHEMBL5844205 0.71 ALDH1A1 (0.31) ALDH1A1
SCHEMBL5874443 0.70
SCHEMBL936386 0.69 ALDH1A1 (0.32) ALDH1A1
SCHEMBL1505860 0.69 MEN1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed