Trichloroacetic Acid

Trichloroacetic Acid

SCHEMBL5874537

C[N+](C)(C)Cc1ccccc1.O=C([O-])C(Cl)(Cl)Cl

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.59
KDM4E B2RXH2 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
ALPL P05186 1/20 0.46
POLB P06746 1/20 0.46
ALPG P10696 1/20 0.46
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
DNM1 Q05193 2/20 0.39
KMT2A Q03164 3/20 0.38
LMNA P02545 1/20 0.38
CHRNB2 P17787 2/20 0.38
CHRNA4 P43681 2/20 0.38
MEN1 O00255 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
TP53 P04637 1/20 0.38
MAPK1 P28482 1/20 0.38
HDAC3 O15379 1/20 0.37
HDAC4 P56524 1/20 0.37
HDAC1 Q13547 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pivalate SCHEMBL23069472 0.87 ALDH1A1 (0.61) ALDH1A1KDM4ETDP1ALPLPOLB
Bicarbonate SCHEMBL988121 0.87 ALDH1A1 (0.71) ALDH1A1KDM4ETDP1ALPLPOLB
Bicarbonate SCHEMBL988119 0.87 ALDH1A1 (0.71) ALDH1A1KDM4ETDP1ALPLPOLB
Trifluoroacetic Acid SCHEMBL1130240 0.86 KDM4E (0.59) ALDH1A1KDM4ETDP1ALPLPOLB
SCHEMBL14891416 0.86 ALDH1A1 (0.59) ALDH1A1KDM4ETDP1ALPLPOLB
Acetic Acid SCHEMBL593316 0.85 ALDH1A1 (0.68) ALDH1A1KDM4ETDP1ALPLPOLB
Oxalic Acid SCHEMBL153608 0.85 ALDH1A1 (0.68) ALDH1A1KDM4ETDP1ALPLPOLB
Bicarbonate SCHEMBL2774106 0.85 ALDH1A1 (0.68) ALDH1A1KDM4ETDP1ALPLPOLB
Trichloroacetic Acid SCHEMBL22188531 0.85 ALPL (0.42) ALDH1A1KDM4ETDP1ALPLPOLB
Chloroacetic Acid SCHEMBL5874297 0.84 ALDH1A1 (0.61) ALDH1A1KDM4ETDP1ALPLPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed