Malonic Acid

Malonic Acid

SCHEMBL5874646

CCCN(CCC)CCC.CCCN(CCC)CCC.O=C(O)CC(=O)O

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.50
SRR Q9GZT4 1/20 0.50
CA12 O43570 2/20 0.44
CA9 Q16790 2/20 0.44
CA2 P00918 1/20 0.44
KDM5A P29375 5/20 0.42
FFAR3 O14843 2/20 0.41
HDAC3 O15379 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
KDM4C Q9H3R0 3/20 0.40
PHF8 Q9UPP1 2/20 0.40
TDP1 Q9NUW8 3/20 0.39
EYA2 O00167 1/20 0.39
APP P05067 1/20 0.39
ACE P12821 1/20 0.39
TSHR P16473 3/20 0.38
DRD3 P35462 2/20 0.38
DRD2 P14416 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL5874653 1.00 LDHA (0.50) LDHASRRCA12CA9CA2
SCHEMBL3199687 0.86 FFAR3 (0.52) KDM5AFFAR3HDAC3HDAC1HDAC2
SCHEMBL9621247 0.86 FFAR3 (0.52) KDM5AFFAR3HDAC3HDAC1HDAC2
Propionic Acid SCHEMBL3410973 0.86 FFAR3 (0.59) CA12CA9CA2KDM5AFFAR3
Bicarbonate SCHEMBL5875239 0.85 CA12 (0.50) CA12CA9CA2KDM5AFFAR3
Bicarbonate SCHEMBL5875232 0.85 CA12 (0.50) CA12CA9CA2KDM5AFFAR3
SCHEMBL11585196 0.84 FFAR3 (0.50) KDM5AFFAR3HDAC3HDAC1HDAC2
Malonic Acid SCHEMBL5874144 0.84 KDM5A (0.58) LDHASRRCA12CA9KDM5A
SCHEMBL8194762 0.84 FFAR3 (0.50) KDM5AFFAR3HDAC3HDAC1HDAC2
Ammonia Solution, Strong SCHEMBL28145013 0.84 FFAR3 (0.50) KDM5AFFAR3HDAC3HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed