Malonic Acid

Malonic Acid

SCHEMBL5874776

CCNCC.CCNCC.O=C(O)CC(=O)O

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CCKAR

The experimentally established mechanism targets of Malonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.60
SRR Q9GZT4 1/20 0.60
TP53 P04637 1/20 0.53
FFAR3 O14843 2/20 0.47
HDAC3 O15379 1/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
AKR1B1 P15121 1/20 0.35
MCL1 Q07820 1/20 0.35
GPR84 Q9NQS5 7/20 0.33
PPARG P37231 6/20 0.33
PPARD Q03181 6/20 0.33
PPARA Q07869 6/20 0.33
HDAC11 Q96DB2 5/20 0.33
TSHR P16473 4/20 0.33
ALDH1A1 P00352 2/20 0.33
TLR2 O60603 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
MEN1 O00255 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL5874780 1.00 LDHA (0.60) LDHASRRTP53FFAR3HDAC3
Malonic Acid SCHEMBL15710285 0.91 LDHA (0.50) LDHASRRTP53FFAR3HDAC3
Diethylamine SCHEMBL27846018 0.88 TP53 (0.47) LDHASRRTP53FFAR3HDAC3
Diethylamine SCHEMBL27846019 0.88 TP53 (0.47) LDHASRRTP53FFAR3HDAC3
Propionic Acid SCHEMBL1014332 0.87 FFAR3 (0.67) LDHASRRTP53FFAR3HDAC3
Propionic Acid SCHEMBL28428410 0.87 FFAR3 (0.67) LDHASRRTP53FFAR3HDAC3
Malonic Acid SCHEMBL15710925 0.87 LDHA (0.45) LDHASRRTP53FFAR3HDAC3
Diethylamine SCHEMBL5874292 0.86 TP53 (0.61) LDHASRRTP53FFAR3HDAC3
Diethylamine SCHEMBL4340639 0.86
Acetoacetic Acid SCHEMBL10800228 0.85 TP53 (0.44) LDHASRRTP53FFAR3HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112526822-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2025-02-28 CN disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-111856882-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-11-29 CN disclosed
CN-118620392-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-09-10 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed