Trichloroacetic Acid

Trichloroacetic Acid

SCHEMBL5874938

CC(N)O.O=C(O)C(Cl)(Cl)Cl

nearest known ligand 0.59

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.59
TP53 P04637 2/20 0.59
TSHR P16473 2/20 0.59
SLC7A5 Q01650 2/20 0.39
GABRP O00591 4/20 0.35
GABRD O14764 4/20 0.35
GABRA1 P14867 4/20 0.35
GABRB1 P18505 4/20 0.35
GABRG2 P18507 4/20 0.35
GABRB3 P28472 4/20 0.35
GABRA5 P31644 4/20 0.35
GABRA3 P34903 4/20 0.35
GABRA2 P47869 4/20 0.35
GABRB2 P47870 4/20 0.35
GABRA4 P48169 4/20 0.35
GABRE P78334 4/20 0.35
GABRA6 Q16445 4/20 0.35
GABRG1 Q8N1C3 4/20 0.35
GABRG3 Q99928 4/20 0.35
GABRQ Q9UN88 4/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trichloroacetic Acid SCHEMBL28668260 0.91 ALDH1A1 (0.62) ALDH1A1TP53TSHRSLC7A5GABRP
Trichloroacetic Acid SCHEMBL5669719 0.81 ALDH1A1 (0.67) ALDH1A1TP53TSHRGABRPGABRD
Trichloroacetic Acid SCHEMBL5875229 0.81
Trichloroacetic Acid SCHEMBL28143853 0.79 ALDH1A1 (0.62) ALDH1A1TP53TSHRCYP2C19
Trichloroacetic Acid SCHEMBL5874385 0.78 TP53 (0.53) ALDH1A1TP53TSHRCYP2C19
Trichloroacetic Acid SCHEMBL5875454 0.78 TP53 (0.53) ALDH1A1TP53TSHRCYP2C19CYP1A2
Trichloroacetic Acid SCHEMBL8995195 0.77
Bicarbonate SCHEMBL1833319 0.77
Trichloroacetic Acid SCHEMBL38661501 0.77
Trichloroacetic Acid SCHEMBL10493657 0.77 TSHR (1.00) ALDH1A1TP53TSHRCYP2C19CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed