Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL1832823 | 0.80 | TP53 (0.47) | TP53ALDH1A1TSHRCYP2C19 | |
| Chloromethane SCHEMBL869309 | 0.80 | — | — | |
| Trifluoroacetic Acid SCHEMBL357774 | 0.79 | TP53 (0.36) | TP53ALDH1A1TSHR | |
| Trichloroacetic Acid SCHEMBL5875454 | 0.79 | TP53 (0.53) | TP53ALDH1A1TSHRCYP2C19 | |
| Trichloroacetic Acid SCHEMBL5874938 | 0.78 | ALDH1A1 (0.59) | TP53ALDH1A1TSHRCYP2C19 | |
| Trichloroacetic Acid SCHEMBL5669719 | 0.77 | ALDH1A1 (0.67) | TP53ALDH1A1TSHRCYP2C19 | |
| Acetic Acid SCHEMBL1831396 | 0.77 | FFAR3 (0.47) | TP53ALDH1A1TSHRCYP2C19 | |
| Oxalic Acid SCHEMBL1834268 | 0.77 | TP53 (0.44) | TP53ALDH1A1TSHRCYP2C19 | |
| Dichloroacetic Acid SCHEMBL5874158 | 0.76 | LMNA (0.56) | TP53ALDH1A1TSHR | |
| Trichloroacetic Acid SCHEMBL28668260 | 0.75 | ALDH1A1 (0.62) | TP53ALDH1A1TSHRCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |