Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR1 | O14842 | 1/20 | 0.41 |
| ▸ | PLAU | P00749 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | CASP3 | P42574 | 1/20 | 0.38 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.38 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.38 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | TACR1 | P25103 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL514414 | 0.81 | FFAR1 (0.44) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL9363502 | 0.81 | FFAR1 (0.41) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL29728038 | 0.80 | IDO1 (0.38) | KMT2AMEN1ALDH1A1KDM4ETSHR | |
| SCHEMBL8602403 | 0.80 | IDO1 (0.38) | KMT2AMEN1ALDH1A1KDM4ETSHR | |
| SCHEMBL515209 | 0.79 | FFAR1 (0.44) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL515210 | 0.79 | ALDH1A1 (0.48) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL6668462 | 0.78 | FFAR1 (0.46) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL3156172 | 0.76 | FFAR1 (0.42) | FFAR1PLAURAB9AKMT2ANPC1 | |
| SCHEMBL6517065 | 0.75 | ALDH1A1 (0.50) | FFAR1RAB9AKMT2ANPC1ALDH1A1 | |
| SCHEMBL2162474 | 0.75 | GABRA1 (0.42) | FFAR1ALDH1A1KDM4ECYP19A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078607-B1 | PROCESS FOR PRODUCING A METAL FILM COATED MATERIAL, PROCESS FOR PRODUCING A METALLIC PATTERN BEARING MATERIAL AND USE OF A COMPOSITION FOR POLYMER LAYER FORMATION | FUJIFILM CORP (JP) | 2018-09-12 | — | — | EP | disclosed |
| EP-2236647-B1 | PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| EP-2247171-B1 | METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM CORP (JP) | 2015-04-22 | — | — | EP | disclosed |
| CN-103588930-A | Nitrile group-containing polymer, method for synthesizing same, composition using nitrile group-containing polymer, and laminate | FUJIFILM CORP | 2014-02-19 | — | — | CN | disclosed |
| CN-101528458-B | Surface metal film material and method for producing same, metal mold material and method for producing same, composition for forming polymer layer, nitrile group-containing polymer and method for synthesizing same, composition using nitrile group-containing polymer, and laminate | FUJIFILM CORP | 2013-10-30 | — | — | CN | disclosed |
| CN-101911844-B | Metal-clad substrate, and method for production thereof | FUJI PHOTO FILM CO LTD | 2012-11-14 | — | — | CN | disclosed |
| CN-101652247-B | Conductive substance-adsorbing resin film, method for producing conductive substance-adsorbing resin film, resin film with metal layer using same, and method for producing resin film with metal layer | FUJI PHOTO FILM CO LTD | 2012-11-07 | — | — | CN | disclosed |
| CN-101910461-B | Plating method, method for forming metal thin film, and plating catalyst liquid | FUJIFILM CORP | 2012-10-31 | — | — | CN | disclosed |
| CN-101910462-B | Adsorption method of plating catalyst, and method for manufacturing substrate coated with metal layer | FUJI PHOTO FILM CO LTD | 2012-09-26 | — | — | CN | disclosed |
| US-8273463-B2 | Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material | FUJIFILM CORPORATION (JP) | 2012-09-25 | — | — | US | disclosed |
| US-20100113264-A1 | CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METHOD FOR PRODUCING CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METAL LAYER-COATED RESIN FILM USING THE SAME, AND METHOD FOR PRODUCING METAL LAYER-COATED RESIN FILM | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| CN-101652247-A | Conductive substance-adsorbing resin film, method for producing conductive substance-adsorbing resin film, resin film with metal layer using same, and method for producing resin film with metal layer | FUJIFILM CORP JP | 2010-02-17 | — | — | CN | disclosed |
| US-20100003533-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-2133200-A1 | CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, PROCESS FOR PRODUCING CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, METAL-LAYER-COATED RESIN FILM MADE FROM THE SAME, AND PROCESS FOR PRODUCING METAL-LAYER-COATED RESIN FILM | Fujifilm Corporation (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-20090269599-A1 | MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2105451-A2 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | Fujifilm Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |
| CN-101528458-A | Surface metal film material and method for producing same, metal mold material and method for producing same, composition for forming polymer layer, nitrile group-containing polymer and method for synthesizing same, composition using nitrile group-containing polymer, and laminate | FUJIFILM CORP (JP) | 2009-09-09 | — | — | CN | disclosed |
| US-20090214876-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2078607-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE POLYMER, AND LAYERED PRODUCT | FUJIFILM Corporation (JP) | 2009-07-15 | — | — | EP | disclosed |
| US-20090155553-A1 | Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition | FUJIFILM CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |