SCHEMBL5875199

SCHEMBL5875199

O=C(ON1CCCCC1)C(Cl)Cl

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5874105 0.79 ALDH1A1 (0.33) ALDH1A1
SCHEMBL5874356 0.78 CA2 (0.34)
SCHEMBL11887150 0.77 ALDH1A1 (0.32) ALDH1A1
SCHEMBL5874768 0.77 ALDH1A1 (0.32) ALDH1A1
SCHEMBL2786080 0.76 HTT (0.30)
SCHEMBL7718861 0.76 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5074820 0.74 ALDH1A1 (0.31) ALDH1A1
SCHEMBL5856414 0.74 DPP7 (0.33) ALDH1A1
SCHEMBL6999258 0.73 ALDH1A1 (0.36) ALDH1A1GAA
SCHEMBL15153153 0.73 ALDH1A1 (0.32) ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
US-4433037-A WITH COBALT AMINE OXIDIZING AGENT AND COMPLEXING AGENT EASTMAN KODAK COMPANY (US) 1984-02-21 US disclosed