⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL587172 | 0.93 | — | — | |
| SCHEMBL19881284 | 0.91 | ALDH1A1 (0.34) | — | |
| SCHEMBL6953381 | 0.91 | ALDH1A1 (0.37) | — | |
| SCHEMBL10049468 | 0.87 | ALDH1A1 (0.34) | — | |
| SCHEMBL587725 | 0.84 | — | — | |
| SCHEMBL10049465 | 0.82 | ALDH1A1 (0.34) | — | |
| SCHEMBL10049469 | 0.82 | ALDH1A1 (0.34) | — | |
| SCHEMBL19881224 | 0.81 | ZDHHC20 (0.35) | — | |
| SCHEMBL10049471 | 0.76 | ALDH1A1 (0.37) | — | |
| SCHEMBL11224079 | 0.76 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-2078607-B1 | PROCESS FOR PRODUCING A METAL FILM COATED MATERIAL, PROCESS FOR PRODUCING A METALLIC PATTERN BEARING MATERIAL AND USE OF A COMPOSITION FOR POLYMER LAYER FORMATION | FUJIFILM CORP (JP) | 2018-09-12 | — | — | EP | disclosed |
| EP-2236647-B1 | PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| CN-103588930-B | Nitrile group-containing polymer, method for synthesizing same, composition using nitrile group-containing polymer, and laminate | 富士胶片株式会社 | 2017-04-26 | — | — | CN | disclosed |
| EP-2247171-B1 | METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM CORP (JP) | 2015-04-22 | — | — | EP | disclosed |
| CN-103588930-A | Nitrile group-containing polymer, method for synthesizing same, composition using nitrile group-containing polymer, and laminate | FUJIFILM CORP | 2014-02-19 | — | — | CN | disclosed |
| CN-101528458-B | Surface metal film material and method for producing same, metal mold material and method for producing same, composition for forming polymer layer, nitrile group-containing polymer and method for synthesizing same, composition using nitrile group-containing polymer, and laminate | FUJIFILM CORP | 2013-10-30 | — | — | CN | disclosed |
| US-8273463-B2 | Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material | FUJIFILM CORPORATION (JP) | 2012-09-25 | — | — | US | disclosed |
| EP-2105451-B1 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | FUJIFILM CORP (JP) | 2012-02-15 | — | — | EP | disclosed |
| EP-2236647-A1 | PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES | FUJIFILM Corporation (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-2230328-A1 | PLATING METHOD, METHOD FOR FORMING METAL THIN FILM, AND PLATING CATALYST LIQUID | FUJIFILM Corporation (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-20100113264-A1 | CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METHOD FOR PRODUCING CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METAL LAYER-COATED RESIN FILM USING THE SAME, AND METHOD FOR PRODUCING METAL LAYER-COATED RESIN FILM | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20100003533-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-2133200-A1 | CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, PROCESS FOR PRODUCING CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, METAL-LAYER-COATED RESIN FILM MADE FROM THE SAME, AND PROCESS FOR PRODUCING METAL-LAYER-COATED RESIN FILM | Fujifilm Corporation (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-20090269599-A1 | MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2105451-A2 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | Fujifilm Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20090214876-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2078607-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE POLYMER, AND LAYERED PRODUCT | FUJIFILM Corporation (JP) | 2009-07-15 | — | — | EP | disclosed |
| US-20090155553-A1 | Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition | FUJIFILM CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |