SCHEMBL587910

SCHEMBL587910

C=CC(=O)Oc1cccc(C#N)c1

nearest known ligand 0.49

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 13/20 0.49
PRSS1 P07477 1/20 0.49
ACR P10323 1/20 0.49
P4HB P07237 1/20 0.44
GSK3B P49841 2/20 0.41
THRB P10828 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28577855 0.85 MGLL (0.50) MGLLPRSS1ACRP4HBGSK3B
SCHEMBL16182806 0.83 FFAR1 (0.46) THRB
SCHEMBL8580189 0.82 MGLL (0.54) MGLLPRSS1ACRP4HBGSK3B
SCHEMBL421454 0.82 KMT2A (0.56) THRBSMN1; SMN2
SCHEMBL6667481 0.81 MGLL (0.52) MGLLPRSS1ACRP4HBGSK3B
SCHEMBL6667487 0.81 MGLL (0.52) MGLLPRSS1ACRGSK3BSMN1; SMN2
SCHEMBL16182974 0.81 FFAR1 (0.44) THRB
SCHEMBL17460125 0.79 MGLL (0.51) MGLLPRSS1ACRP4HBGSK3B
SCHEMBL16439785 0.79 MGLL (0.51) MGLLPRSS1ACRP4HBGSK3B
SCHEMBL10547627 0.79 CYP3A4 (0.58) MGLLPRSS1ACRP4HBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122059850-A Preparation method and application of novel benzyl cyanide ester insect covalent pheromone 江西中医药大学 2026-05-19 CN disclosed
EP-3375799-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE AND METHOD FOR PRODUCING MOISTURE-PERMEABLE FILM DAINIPPON INK & CHEMICALS (JP) 2025-09-03 EP disclosed
CN-115362215-B Aqueous resin composition and coating agent DIC株式会社 2024-10-18 CN disclosed
CN-115362215-A Aqueous resin composition and coating agent DIC株式会社 2022-11-18 CN disclosed
EP-3375794-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE AND METHOD FOR PRODUCING SYNTHETIC LEATHER DAINIPPON INK & CHEMICALS (JP) 2022-10-26 EP disclosed
CN-109790372-B Aqueous resin composition, coating agent, and article DIC株式会社 2022-03-11 CN disclosed
CN-109790371-B Method for producing semi-IPN type complex DIC株式会社 2021-07-20 CN disclosed
EP-3521371-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE DAINIPPON INK & CHEMICALS (JP) 2021-06-16 EP disclosed
CN-108350132-B Method for producing semi-IPN type composite and method for producing moisture permeable film DIC株式会社 2021-05-28 CN disclosed
CN-108350104-B Method for producing semi-IPN type composite and method for producing synthetic leather DIC株式会社 2021-03-23 CN disclosed
US-20100003533-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2010-01-07 US disclosed
EP-2133200-A1 CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, PROCESS FOR PRODUCING CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, METAL-LAYER-COATED RESIN FILM MADE FROM THE SAME, AND PROCESS FOR PRODUCING METAL-LAYER-COATED RESIN FILM Fujifilm Corporation (JP) 2009-12-16 EP disclosed
US-20090269599-A1 MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
EP-2105451-A2 Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate Fujifilm Corporation (JP) 2009-09-30 EP disclosed
CN-101528458-A Surface metal film material and method for producing same, metal mold material and method for producing same, composition for forming polymer layer, nitrile group-containing polymer and method for synthesizing same, composition using nitrile group-containing polymer, and laminate FUJIFILM CORP (JP) 2009-09-09 CN disclosed
US-20090214876-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2009-08-27 US disclosed
EP-2078607-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE POLYMER, AND LAYERED PRODUCT FUJIFILM Corporation (JP) 2009-07-15 EP disclosed
US-20090155553-A1 Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed
EP-1159264-A2 INHIBITORS OF FACTOR Xa COR THERAPEUTICS, INC. (US) 2001-12-05 EP disclosed
WO-2000047554-A2 INHIBITORS OF FACTOR Xa COR THERAPEUTICS INC. (US) 2000-08-17 WO disclosed