Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.43 |
| ▸ | HSD11B1 | P28845 | 10/20 | 0.36 |
| ▸ | SCN1A | P35498 | 1/20 | 0.32 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.32 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5880684 | 0.84 | CYP17A1 (0.44) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL439024 | 0.83 | CYP17A1 (0.43) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL12847539 | 0.81 | CYP17A1 (0.42) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL133979 | 0.81 | CYP17A1 (0.42) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL8398065 | 0.80 | CYP17A1 (0.40) | CYP17A1CYP19A1HSD11B1MEN1KMT2A | |
| SCHEMBL6249302 | 0.79 | MAPK1 (0.33) | — | |
| SCHEMBL13094606 | 0.79 | CYP17A1 (0.41) | CYP17A1CYP19A1HSD11B1MEN1KMT2A | |
| SCHEMBL13288279 | 0.79 | CYP17A1 (0.44) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL7745860 | 0.79 | CYP17A1 (0.41) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL24064303 | 0.78 | CYP17A1 (0.40) | CYP17A1CYP19A1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7108953-B2 | Dissolution inhibitors in photoresist compositions for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2006-09-19 | — | — | US | claimed |
| US-20050260519-A1 | Dissolution inhibitors in photoresist compositions for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-11-24 | — | — | US | claimed |
| CN-1470010-A | Dissolution inhibitors in photoresist compositions for microlithography | 纳幕尔杜邦公司 | 2004-01-21 | — | — | CN | claimed |
| EP-1325387-A2 | DISSOLUTION INHIBITORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. Dupont de Nemours and Company (US) | 2003-07-09 | — | — | EP | claimed |
| WO-2002031595-A2 | DISSOLUTION INHIBITORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2002-04-18 | — | — | WO | claimed |
| US-20230152693-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |