Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.32 |
| ▸ | SCN1A | P35498 | 1/20 | 0.31 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.31 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5880684 | 0.83 | CYP17A1 (0.44) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL439024 | 0.81 | CYP17A1 (0.43) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL5880685 | 0.81 | CYP17A1 (0.43) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL12847539 | 0.79 | CYP17A1 (0.42) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL44331 | 0.79 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL8398065 | 0.79 | CYP17A1 (0.40) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL4742225 | 0.79 | CYP19A1 (0.49) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL711096 | 0.79 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL39900 | 0.79 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL9608698 | 0.78 | HSD11B1 (0.50) | CYP17A1CYP19A1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080318156-A1 | Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography | CORNELL RESEARCH FOUNDATION, INC. | 2008-12-25 | — | — | US | claimed |
| EP-1991910-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | Cornell Research Foundation, Inc. (US) | 2008-11-19 | — | — | EP | claimed |
| WO-2007094784-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-08-23 | — | — | WO | claimed |
| CN-114641515-B | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2023-12-01 | — | — | CN | disclosed |
| EP-4279411-A1 | MULTILAYER TUBE CONTAINER | Taisei Kako Co., Ltd. (JP) | 2023-11-22 | — | — | EP | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-114641515-A | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2022-06-17 | — | — | CN | disclosed |
| CN-114072730-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2022-02-18 | — | — | CN | disclosed |
| CN-114072474-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2022-02-18 | — | — | CN | disclosed |
| CN-114051501-A | Polymerizable composition, method for producing coated structure, and coating material | 株式会社艾迪科 | 2022-02-15 | — | — | CN | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070190451-A1 | Calixresorcinarene compounds, photoresist base materials, and compositions thereof | IDEMITSU KOSAN CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| CN-1938259-A | Calixarene compound, photoresist base material and composition thereof | IDEMITSU KOSAN CO (JP) | 2007-03-28 | — | — | CN | disclosed |
| EP-1736829-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1734032-A1 | CALIXRESORCINARENE COMPOUNDS, PHOTORESIST BASE MATERIALS, AND COMPOSITIONS THEREOF | IDEMITSU KOSAN CO., LTD. (JP) | 2006-12-20 | — | — | EP | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| WO-2005097725-A1 | CALIXRESORCINARENE COMPOUNDS, PHOTORESIST BASE MATERIALS, AND COMPOSITIONS THEREOF | IDEMITSU KOSAN CO., LTD. (JP) | 2005-10-20 | — | — | WO | disclosed |