SCHEMBL5881706

SCHEMBL5881706

CCCCOc1ccc2cc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c3ccccc3)ccc2c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KAT6A Q92794 2/20 0.44
TSHR P16473 2/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
PTPN11 Q06124 1/20 0.41
RAPGEF3 O95398 1/20 0.41
GAA P10253 3/20 0.39
ALDH1A1 P00352 3/20 0.39
LMNA P02545 1/20 0.39
HRAS P01112 1/20 0.39
KRAS P01116 1/20 0.39
MAPK1 P28482 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
KDM4E B2RXH2 1/20 0.39
TP53 P04637 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5881619 0.97 PTPN11 (0.46) KAT6ATSHRPTPN11TP53
SCHEMBL5881831 0.94 CA12 (0.47) TSHRCA12CA1CA2CA7
SCHEMBL5882063 0.91 CA12 (0.44) TSHRCA12CA1CA2CA7
SCHEMBL5882079 0.91 TSHR (0.45) TSHRCA12CA1CA2CA7
SCHEMBL5882157 0.91 RAPGEF3 (0.43) TSHRCA12CA1CA2CA7
SCHEMBL5881868 0.91 TSHR (0.45) TSHRCA12CA1CA2CA7
SCHEMBL5881612 0.90 THRA (0.46) TSHRCA12CA1CA2CA7
SCHEMBL5881880 0.90 THRA (0.46) TSHRCA12CA1CA2CA7
SCHEMBL5881861 0.90 THRA (0.46) TSHRCA12CA1CA2CA7
SCHEMBL5882482 0.90 THRA (0.46) TSHRCA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7056640-B2 Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-06-06 US disclosed
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process POLL, PIM3, VEGFA KAT6A 4324/4885TSHR 1653/4885CA12 2701/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.