SCHEMBL5881845

SCHEMBL5881845

CCCCOc1ccc2cc(S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)(C)C)ccc2c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 2/20 0.40
CA12 O43570 3/20 0.40
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
CA9 Q16790 3/20 0.40
CA7 P43166 2/20 0.40
TSHR P16473 1/20 0.40
MMP2 P08253 2/20 0.38
MMP13 P45452 2/20 0.38
ADAMTS4 O75173 1/20 0.38
MMP14 P50281 1/20 0.38
ADAMTS5 Q9UNA0 1/20 0.38
THRA P10827 1/20 0.38
RAPGEF3 O95398 1/20 0.37
LMNA P02545 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
KAT6A Q92794 2/20 0.36
CA3 P07451 1/20 0.36
CA4 P22748 1/20 0.36
CA6 P23280 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5882132 0.97 THRA (0.43) MMP1CA12CA1CA2CA9
SCHEMBL5845514 0.91 MMP1 (0.37) MMP1CA12CA1CA2CA9
SCHEMBL6736749 0.86 TSHR (0.46) MMP1CA12CA1CA2CA9
SCHEMBL5845036 0.85 S1PR3 (0.40) MMP1CA12CA1CA2CA9
SCHEMBL5843178 0.83 THRA (0.38) MMP1CA12CA1CA2CA9
SCHEMBL5844406 0.83 MEN1 (0.36) MMP1CA12CA1CA2CA9
SCHEMBL5882174 0.82 KAT6A (0.46) RAPGEF3KAT6A
SCHEMBL5881831 0.82 CA12 (0.47) MMP1CA12CA1CA2CA9
SCHEMBL5881935 0.80 PTPN11 (0.46) TSHRTHRAKAT6A
SCHEMBL5882063 0.80 CA12 (0.44) CA12CA1CA2CA9CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7056640-B2 Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-06-06 US disclosed
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process POLL, PIM3, VEGFA MMP1 4646/4885CA12 2701/4885CA1 2908/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.