Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | FABP7 | O15540 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2924441 | 0.76 | HTT (0.48) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL2924105 | 0.73 | HTT (0.45) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL4951808 | 0.72 | HTT (0.54) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL871325 | 0.71 | HTT (0.43) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL8654645 | 0.71 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL1143909 | 0.71 | HTT (0.59) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL308851 | 0.71 | HTT (0.59) | HTTFABP7MEN1ALDH1A1TSHR | |
| SCHEMBL28916595 | 0.71 | CHRNB2 (0.39) | — | |
| Phosphonic Acid SCHEMBL8154966 | 0.70 | HTT (0.42) | HTTMEN1ALDH1A1TSHRKMT2A | |
| Carbamic Acid SCHEMBL17473082 | 0.70 | HTT (0.42) | HTTFABP7MEN1ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8114220-B2 | Co-solvent, chelating agent, optionally ion pairing reagent, and optionally surfactant, dense fluid; effectively removes photoresist and/or post-etch residue material from microelectronic device without substantially over-etching underlying silicon-containing layers and metallic interconnect material | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-02-14 | — | — | US | claimed |
| US-20080269096-A1 | Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices | Advance Technology Materials, Inc. (US) | 2008-10-30 | — | — | US | claimed |
| EP-1879704-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-01-23 | — | — | EP | claimed |
| WO-2006113621-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-10-26 | — | — | WO | claimed |
| US-8114220-B2 | Co-solvent, chelating agent, optionally ion pairing reagent, and optionally surfactant, dense fluid; effectively removes photoresist and/or post-etch residue material from microelectronic device without substantially over-etching underlying silicon-containing layers and metallic interconnect material | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-02-14 | — | — | US | disclosed |
| US-20080269096-A1 | Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices | Advance Technology Materials, Inc. (US) | 2008-10-30 | — | — | US | disclosed |
| EP-1879704-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-01-23 | — | — | EP | disclosed |
| WO-2006113621-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-10-26 | — | — | WO | disclosed |
| US-6638749-B1 | Fluoroether sulfate, fluoroether- polyethylene glycol block copolymer, fluoroether sorbitol or fluoroether dithicarbamate chelate; solubilizes proteins, peptides and amino acids | GENENCOR INTERNATIONAL, INC. | 2003-10-28 | — | — | US | disclosed |
| US-6562605-B1 | Extraction of water soluble biopolymers from a fluid; form carbon dioxide/surfactant mixture, mix with water soluble biopolymer, recover biopolymer from mixture | GENENCOR INTERNATIONAL, INC. | 2003-05-13 | — | — | US | disclosed |
| WO-1997018234-A2 | EXTRACTION OF PROTEINS INTO CARBON DIOXIDE | GENENCOR INTERNATIONAL, INC. (US) | 1997-05-22 | — | — | WO | disclosed |