Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 1/20 | 0.47 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.47 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.47 |
| ▸ | CETP | P11597 | 1/20 | 0.40 |
| ▸ | ACACB | O00763 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | PTPN2 | P17706 | 2/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.34 |
| ▸ | DUSP3 | P51452 | 2/20 | 0.34 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17717381 | 0.76 | CETP (0.44) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| SCHEMBL4620171 | 0.74 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| SCHEMBL4620862 | 0.74 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| SCHEMBL3360326 | 0.72 | TSHR (0.42) | TSHR | |
| SCHEMBL25395454 | 0.72 | SLC1A3 (0.35) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| Iodide SCHEMBL25392670 | 0.72 | SLC1A3 (0.35) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| SCHEMBL649529 | 0.70 | TSHR (0.45) | TSHR | |
| SCHEMBL1107005 | 0.69 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1CETPACACB | |
| SCHEMBL2465350 | 0.68 | THRB (0.41) | TSHR | |
| SCHEMBL11133135 | 0.68 | TSHR (0.39) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060128914-A1 | photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-15 | — | — | US | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | disclosed |
| US-20060128914-A1 | photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-15 | — | — | US | disclosed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | disclosed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | disclosed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | disclosed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | disclosed |