Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11477473 | 0.91 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL26923915 | 0.89 | ALDH1A1 (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL4975784 | 0.88 | TSHR (0.41) | TSHRALDH1A1THRB | |
| SCHEMBL11133134 | 0.87 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL651477 | 0.87 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL6422504 | 0.87 | TSHR (0.36) | TSHRALDH1A1 | |
| SCHEMBL3360326 | 0.86 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL4980922 | 0.85 | LMNA (0.41) | TSHRALDH1A1 | |
| SCHEMBL4975150 | 0.84 | LMNA (0.43) | TSHRALDH1A1 | |
| SCHEMBL2465350 | 0.81 | THRB (0.41) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0956153-B1 | DISPERSING AGENT | EFKA ADDITIVES B V (NL) | 2002-10-02 | — | — | EP | claimed |
| EP-0956153-A1 | DISPERSING AGENT | Ekfa Chemicals B.V. (NL) | 1999-11-17 | — | — | EP | claimed |
| US-5882393-A | REACTION PRODUCT OF POLYISOCYANATES WITH A COMPOUND OF RING STRUCTURE WITH AT LEAST ONE NITROGEN ATOM IN RING; LACQUER | EFKA CHEMICALS B.V. (NL) | 1999-03-16 | — | — | US | claimed |
| WO-1997026984-A1 | DISPERSING AGENT | EKFA CHEMICALS B.V. (NL) | 1997-07-31 | — | — | WO | claimed |
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-114174351-A | Resin composition | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| CN-107797304-B | Contact lens product | 星欧光学股份有限公司 | 2021-04-20 | — | — | CN | disclosed |
| CN-104854509-B | Coating liquid for forming inorganic oxide coating film, and display device | 日产化学工业株式会社 | 2021-04-13 | — | — | CN | disclosed |
| CN-112639618-A | Negative photosensitive resin composition | 日产化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| WO-2021024928-A1 | RESIN COMPOSITION | 日産化学株式会社 | 2021-02-11 | — | — | WO | disclosed |
| CN-105765458-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-111684358-A | Photosensitive resin composition | 日产化学株式会社 | 2020-09-18 | — | — | CN | disclosed |
| US-20120148809-A1 | HIGH HARDNESS IMPRINT MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8119327-B2 | Hard, cold flowable, photosensitive photoresist coatings; consistant flexibility; strippability; shelf life; prepolymers comprised of such as methyl methacrylate, benzyl methacrylate and glycidyl methacrylate; photocuring with diacrylate monomer or oligimer | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) | 2012-02-21 | — | — | US | disclosed |
| EP-1487888-B1 | POLYMERISABLE COMPOSITION | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2008-10-22 | — | — | EP | disclosed |
| US-20050170094-A1 | Polymerisable composition | HUNTSMAN ADVANCED MATERIALS AMERICAS INC | 2005-08-04 | — | — | US | disclosed |
| EP-1487888-A2 | POLYMERISABLE COMPOSITION | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2004-12-22 | — | — | EP | disclosed |
| WO-2003082937-A9 | POLYMERISABLE COMPOSITION | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2004-09-16 | — | — | WO | disclosed |
| WO-2003082937-A2 | POLYMERISABLE COMPOSITION | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2003-10-09 | — | — | WO | disclosed |
| US-5547762-A | THERMOSETTING RESIN LAYER | BRIDGESTONE CORPORATION (JP) | 1996-08-20 | — | — | US | disclosed |