Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.68 |
| ▸ | MAOA | P21397 | 3/20 | 0.52 |
| ▸ | MAOB | P27338 | 3/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.42 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | RHEB | Q15382 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL179817 | 0.86 | NR1H2 (0.47) | IDO1MAOAMAOBMEN1KMT2A | |
| SCHEMBL481976 | 0.86 | MAOA (0.64) | MAOAMAOBMEN1KMT2ACHRNA7 | |
| SCHEMBL9475224 | 0.86 | MAOA (0.64) | MAOAMAOBMEN1KMT2ACHRNA7 | |
| SCHEMBL9476350 | 0.86 | MAOA (0.64) | MAOAMAOBMEN1KMT2ACHRNA7 | |
| SCHEMBL6546576 | 0.83 | MAOA (0.61) | MAOAMAOBMEN1KMT2ACHRNA7 | |
| SCHEMBL6546581 | 0.83 | MAOA (0.61) | MAOAMAOBMEN1KMT2ACHRNA7 | |
| SCHEMBL1157999 | 0.83 | NR1H2 (0.45) | IDO1MAOAMAOBMEN1KMT2A | |
| SCHEMBL48247 | 0.83 | — | — | |
| SCHEMBL7735432 | 0.80 | — | — | |
| SCHEMBL5562378 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2758454-B1 | SOLUTION PHASE PROCESSING OF POLYARYLENE SULFIDE | DU PONT (US) | 2015-07-08 | — | — | EP | disclosed |
| US-7026372-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |