Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4611994 | 1.00 | THRB (0.32) | THRB | |
| SCHEMBL2979707 | 0.98 | — | — | |
| SCHEMBL13894748 | 0.89 | THRB (0.37) | THRB | |
| SCHEMBL1536824 | 0.86 | THRB (0.43) | THRB | |
| SCHEMBL1536925 | 0.86 | THRB (0.43) | THRB | |
| SCHEMBL476532 | 0.86 | THRB (0.43) | THRB | |
| SCHEMBL2462841 | 0.86 | THRB (0.43) | THRB | |
| SCHEMBL1536991 | 0.86 | THRB (0.43) | THRB | |
| SCHEMBL2568582 | 0.86 | THRB (0.31) | THRB | |
| SCHEMBL1415453 | 0.86 | THRB (0.43) | THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7031589-B2 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA (US) | 2006-04-18 | — | — | US | claimed |
| US-20040264908-A1 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2004-12-30 | — | — | US | claimed |
| CN-115803350-B | Method for producing hollow fine particles and hollow fine particles | 大金工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| US-20230144395-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| EP-4166579-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | Daikin Industries, Ltd. (JP) | 2023-04-19 | — | — | EP | disclosed |
| EP-3786243-B1 | ANTI-FOULING COATING COMPOSITION, OPTICAL MEMBER, AND LIGHTING DEVICE | PANASONIC IP MAN CO LTD (JP) | 2023-04-12 | — | — | EP | disclosed |
| US-11512209-B2 | Antifouling coating composition, optical member, and light fixture | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2022-11-29 | — | — | US | disclosed |
| EP-3967715-A1 | HOLLOW FINE PARTICLE PRODUCTION METHOD AND HOLLOW FINE PARTICLES | Daikin Industries, Ltd. (JP) | 2022-03-16 | — | — | EP | disclosed |
| US-20210397097-A1 | METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING WITH IMPRINT-ELECTRONIC LITHOGRAPHY, METHOD OF PRODUCING REPLICA MOLD, METHOD OF PRODUCING DEVICE, AND IMPRINT MATERIAL | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210249700-A1 | COATED PARTICLES, POSITIVE ELECTRODE, NEGATIVE ELECTRODE, ALL-SOLID-STATE BATTERY, AND COATING COMPOSITION FOR SULFIDE-BASED ALL-SOLID-STATE BATTERIES | DAIKIN INDUSTRIES, LTD. (JP) | 2021-08-12 | — | — | US | disclosed |
| EP-3854826-A1 | COATED PARTICLES, POSITIVE ELECTRODE, NEGATIVE ELECTRODE, ALL-SOLID-STATE BATTERY, AND COATING COMPOSITION FOR SULFIDE-BASED ALL-SOLID-STATE BATTERIES | DAIKIN INDUSTRIES, LTD. (JP) | 2021-07-28 | — | — | EP | disclosed |
| EP-3410209-B1 | METHOD OF FORMING RESIST PATTERN | ZEON CORP (JP) | 2021-03-10 | — | — | EP | disclosed |
| US-10809618-B2 | Method of forming resist pattern | ZEON CORPORATION (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20200257198-A1 | POSITIVE RESIST COMPOSITION, RESIST FILM FORMATION METHOD, AND LAMINATE MANUFACTURING METHOD | ZEON CORPORATION (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20190056664-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190004425-A1 | METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3409700-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING METHOD | Zeon Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| EP-3410209-A1 | RESIST PATTERN FORMING METHOD | Zeon Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| US-7031589-B2 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA (US) | 2006-04-18 | — | — | US | disclosed |
| US-20040264908-A1 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2004-12-30 | — | — | US | disclosed |