⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5889533 | 0.98 | THRB (0.32) | — | |
| SCHEMBL4611994 | 0.98 | THRB (0.32) | — | |
| SCHEMBL5889485 | 0.87 | — | — | |
| SCHEMBL13894748 | 0.86 | THRB (0.37) | — | |
| SCHEMBL26114076 | 0.86 | MEN1 (0.31) | — | |
| SCHEMBL156101 | 0.86 | THRB (0.44) | — | |
| SCHEMBL13744718 | 0.86 | — | — | |
| SCHEMBL3371971 | 0.86 | — | — | |
| SCHEMBL2462841 | 0.84 | THRB (0.43) | — | |
| SCHEMBL1536824 | 0.84 | THRB (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7031589-B2 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA (US) | 2006-04-18 | — | — | US | claimed |
| US-20040264908-A1 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2004-12-30 | — | — | US | claimed |
| CN-115803350-B | Method for producing hollow fine particles and hollow fine particles | 大金工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| WO-2023189969-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230144395-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| EP-4166579-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | Daikin Industries, Ltd. (JP) | 2023-04-19 | — | — | EP | disclosed |
| EP-3967715-A1 | HOLLOW FINE PARTICLE PRODUCTION METHOD AND HOLLOW FINE PARTICLES | Daikin Industries, Ltd. (JP) | 2022-03-16 | — | — | EP | disclosed |
| US-20210397097-A1 | METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING WITH IMPRINT-ELECTRONIC LITHOGRAPHY, METHOD OF PRODUCING REPLICA MOLD, METHOD OF PRODUCING DEVICE, AND IMPRINT MATERIAL | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2021-12-23 | — | — | US | disclosed |
| EP-3832695-A1 | MOLDED ARTICLE MANUFACTURING METHOD, IMPRINT-ELECTRONIC WRITING COLLECTIVE MOLDING RESIST, REPLICA MOLD MANUFACTURING METHOD, DEVICE MANUFACTURING METHOD, AND IMPRINT MATERIAL | Tokyo University of Science Foundation (JP) | 2021-06-09 | — | — | EP | disclosed |
| EP-3410209-B1 | METHOD OF FORMING RESIST PATTERN | ZEON CORP (JP) | 2021-03-10 | — | — | EP | disclosed |
| US-10809618-B2 | Method of forming resist pattern | ZEON CORPORATION (JP) | 2020-10-20 | — | — | US | disclosed |
| EP-1652901-B1 | SILICON-CONTAINING FLUOROCHEMICAL SURFACE-TREATING AGENT | DAIKIN IND LTD (JP) | 2012-08-15 | — | — | EP | disclosed |
| US-7776982-B2 | Interpolymer of an alpha-substituted acrylate having a fluoroalkyl group and optionally perfluoroalkoxy units and an unsaturated terminated siloxane; imparts excellent water repellency, oil repellency, soil resistance and feeling to textiles, particularly carpets | DAIKIN INDUSTRIES, LTD. (JP) | 2010-08-17 | — | — | US | disclosed |
| US-7569323-B2 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060134439-A1 | Silicon-containing fluorochemical surface-treating agent | DAIKIN INDUSTRIES, LTD. (JP) | 2006-06-22 | — | — | US | disclosed |
| EP-1652901-A1 | SILICON-CONTAINING FLUOROCHEMICAL SURFACE-TREATING AGENT | Daikin Industries, Ltd. (JP) | 2006-05-03 | — | — | EP | disclosed |
| US-7031589-B2 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA (US) | 2006-04-18 | — | — | US | disclosed |
| US-20040264908-A1 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2004-12-30 | — | — | US | disclosed |
| EP-0632059-A2 | Interpenetrating networks from unsaturated monomers and thermosetting resins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-01-04 | — | — | EP | disclosed |